利用聚苯乙烯纳米球刻蚀方法结合水热生长制备周期有序δ-MnO_(2)纳米阵列  

Fabrication of Periodically Orderedδ-MnO_(2)Nanoarrays Using Polystyrene(PS)Nanosphere Lithography Method Combined with Hydrothermal Growth

作　　者：张明松 王佳乐 ZHANG Mingsong;WANG Jiale

机构地区：[1]东华大学理学院,上海201620

出　　处：《化工设计通讯》2024年第9期113-115,共3页Chemical Engineering Design Communications

基　　金：上海市自然科学基金(20ZR1401700)。

摘　　要：利用聚苯乙烯(polystyrene,PS)纳米球刻蚀结合水热生长,制备了周期有序的δ-MnO_(2)纳米阵列。首先通过PS纳米球自组装,形成密堆积单层膜,并转移到硅(Si)衬底上。随后反应离子刻蚀(reactive ion etching,RIE)被用来减小PS纳米球的尺寸。然后磁控溅射铜(Cu)材料作为隔离层。将Si衬底上的PS纳米球去除后,磁控溅射MnO_(2)材料。最后通过化学腐蚀方法去除Cu膜,使覆盖在Cu表面的MnO_(2)一起去除,从而得到用于后续水热生长的周期有序排布的MnO_(2)种子位点。制备不同周期的纳米阵列,可通过选择不同直径的PS纳米球获得。通过扫描电子显微镜(scanning electron microscopy,SEM)确认了周期为500和800 nm纳米阵列的形成。利用X射线衍射(X-ray diffraction,XRD)方法确认了阵列中MnO_(2)材料为δ相。本研究为制备半导体材料的有序结构提供了一种新的方法。Periodically orderedδ-MnO_(2)arrays have been fabricated using PS nanosphere lithography method combined with following hydrothermal growth.Firstly,a monolayer of close-packed polystyrene(PS)nanospheres was prepared and transferred onto a silicon(Si)substrate.Then the size of nanospheres was reduced by reactive ion etching(RIE).Subsequently,copper(Cu)was deposited as an isolation layer by magnetron sputtering.After removing the PS nanospheres from the Si substrate,MnO_(2)material was deposited by magnetron sputtering.Finally,the Cu film was removed by chemical etching,and then the MnO_(2)covered on the Cu surface was removed together.Thus periodically ordered MnO_(2)seed sites were formed for the following growth.By selecting PS nanospheres of different diameters,arrays of different periods could be obtained.The formation of arrays of 500 and 800 nm periods was confirmed by scanning electron microscopy(SEM).X-ray diffraction(XRD)was used to confirm that the MnO_(2)material in the nanoarrays wasδphase.This study provides a new method for the ordered structures fabrication of semiconductor materials.

关 键 词：纳米球刻蚀 水热生长 纳米阵列 MnO_(2) 

分 类 号：TB383.1[一般工业技术—材料科学与工程]