薄膜多参数测量系统设计及实验  

Design and Experiment of Multi-parameter Thin-film Measurement System

作　　者：孙伟 金尚忠 张殷 孙紫娟 徐胜 SUN Wei;JIN Shangzhong;ZHANG Yin;SUN Zijuan;XU Sheng(College of Optical and Electronic Technology,China Jiliang University,Hangzhou 310018,CHN;Suzhou Peaktra Technology Co.,Ltd,Suzhou Jiangsu 215004,CHN)

机构地区：[1]中国计量大学光学与电子科技学院,杭州310018 [2]苏州岚创科技有限公司,江苏苏州215004

出　　处：《光电子技术》2024年第3期248-253,264,共7页Optoelectronic Technology

摘　　要：设计薄膜多参数测量系统,对薄膜在制备后膜厚、厚度分布及薄膜残余应力等表征薄膜制备效果的参数同时进行测量,减少测量误差。通过分析椭偏测量、光谱测量和激光测量技术,设计薄膜多参数测量系统,并搭建测量系统。为验证该系统,通过RC2和设计系统对不同厚度的SiO_(2)薄膜和Ta_(2)O_(5)薄膜进行测量对比实验,表明设计系统对不同薄膜厚度的测量偏差均小于0.3 nm,厚度分布测量偏差值小于0.06%;通过ZYGO激光干涉仪和设计系统对不同直径的薄膜进行对比测试实验,表明该系统的测量偏差在±1°以内。测量系统能够满足薄膜制备后对不同参数同时测量的测量需求,简化了测量过程。A multi-parameter measurement system was developed to simultaneously measure film thickness,thickness distribution,residual stress,and other parameters that characterize the effects of film preparation in order to minimize measurement errors.A thin-film multi-parameter measurement system was designed and constructed by analyzing ellipsometry measurement,spectral measurement and laser measurement techniques.To verify the system,RC2 and the design system were used to compare SiO_(2) thin films with Ta_(2)O_(5) thin films of different thicknesses.The results showed that the measurement deviation of the design system for different thin films was less than 0.3 nm,and the measurement deviation of thickness distribution was less than 0.06%.The thick films with different diameters were prepared and compared with the ZYGO laser interferometer,and the measurement deviation of the system was less than±1°.These results showed that the measurement system could meet the requirements of simultaneous measurement of different requirements after film preparation,and simplify the measurement process.

关 键 词：光学检测 椭圆偏振法 光谱 无损检测 

分 类 号：TN206[电子电信—物理电子学] TH744[机械工程—光学工程]