芯片工业园区废水处理工程实例  

An example of wastewater treatment project in chip industrial park

作　　者：刘建红 周隆炎 LIU Jianhong;ZHOU Longyan(Shenzhen Shenshui Buji Water Purification Co.,Ltd.,Shenzhen 518030,China)

机构地区：[1]深圳市深水布吉水质净化有限公司,广东深圳518030

出　　处：《工业用水与废水》2024年第5期77-82,共6页Industrial Water & Wastewater

摘　　要：针对芯片工业废水成分复杂、氟离子浓度高且含有多种有害物质等水质特征,采用化学沉淀-水解酸化-AO/MBR-RO工艺进行处理,RO浓水通过臭氧催化氧化-AO(MBBR)/MBR组合工艺进行处理,同时辅助设计Fenton高级氧化及除氟树脂。出水稳定达到GB 3838—2002《地表水环境质量标准》中Ⅲ类排放标准(ρ(TN)≤15mg/L),满足废水回用要求。详细介绍了污水处理厂各工艺单元的设计参数及主要设备配置,并对工艺特点进行了总结分析。In view of the characteristics of wastewater in chip industry,such as complex composition,high fluoride concentration and containing a variety of harmful substances,chemical precipitation-hydraulic acidification-AO/MBR-RO process was adopted for its treatment.RO concentrated water was treated by combined process of ozone catalytic oxidation-AO(MBBR)/MBR,at the same time,Fenton advanced oxidation technology and fluoride removal resin system were also designed as assistance.The effluent water quality reached classⅢdischarge standard(ρ(TN)≤15 mg/L)in GB 3838—2002 Surface water environmental quality standard,and also met the requirement of wastewater reuse.The design parameters and equipment configuration of each process unit in the sewage treatment plant were introduced in detail,and the technological characteristics were summarized and analyzed.

关 键 词：芯片工业废水 除氟 化学沉淀 AO/MBR MBBR 双膜工艺 地下式污水厂 

分 类 号：X703.1[环境科学与工程—环境工程]