东丽公司光敏聚酰亚胺中国专利分析  

Patent analysis of photosensitive polyimide applied by Toray in China

作　　者：苑伟康[1] 徐建锋 杨斐[1] 郭彦 黄颖[1] 赵锴 翟磊[2] 范琳[2] YUAN Weikang;XU Jianfeng;YANG Fei;GUO Yan;HUANG Ying;ZHAO Kai;ZHAI Lei;FAN Lin(China National Intellectual Property Administration,Beijing 100081,China;Institute of Chemistry,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]国家知识产权局,北京100081 [2]中国科学院化学研究所,北京100190

出　　处：《绝缘材料》2024年第10期106-113,共8页Insulating Materials

基　　金：国家重点研发计划项目资助(2022YFB3603105)。

摘　　要：光敏聚酰亚胺(PSPI)广泛应用于电子、微电子及光学显示等领域,国外企业高度重视有关PSPI材料配方及应用的专利技术保护。本文以日本东丽公司在中国申请的PSPI专利为研究对象,详细分析了专利的申请数量变化、法律状态、技术主题分布等信息,并结合东丽公司代表性的PSPI产品与应用情况,明确了其发展历程、专利保护策略、专利技术构成,以此探讨PSPI材料的技术发展趋势与应用方向。Photosensitive polyimide(PSPI)is widely used in electronics,microelectronics,optical display,and other fields.Foreign companies attach great importance to the patent protection of PSPI material formulas and applications.In this paper,the PSPI patents applied by Toray Industries Inc.in China were taken into research,and the changes in the number of patent applications,legal status,technical subject distribution,and other key information were analyzed in detail.Through combining with Toray's representative PSPI products and their applications,the technical development,patent protection strategy,key points of patent technology of Toray were clarified.Based on the above analysis,the technology development trends and application direction of PSPI materials were explored and presented.

关 键 词：光敏聚酰亚胺 中国专利 东丽公司 技术主题 发展趋势 

分 类 号：TM215[一般工业技术—材料科学与工程] TQ323.7[电气工程—电工理论与新技术]