BiFeO_(3)⁃NiFe_(2)O_(4)复合多铁薄膜的微观结构及磁电耦合研究  

Study on microstructure and magnetoelectric coupling of BiFeO_(3)⁃NiFe_(2)O_(4) composite multiferroic thin films

作　　者：王靖辉 陈双杰 吕晓东 刘嘉琦 唐云龙 朱银莲 马秀良 WANG Jinghui;CHEN Shuangjie;LÜXiaodong;LIU Jiaqi;TANG Yunlong;ZHU Yinlian;MA Xiuliang(Shenyang National Laboratory for Materials Science,Institute of Metal Research,Chinese Academy of Sciences,Shenyang Liaoning 110016;School of Material Science and Engineering,University of Science and Technology of China,Shenyang Liaoning 110016;Bay Area Center for Electron Microscopy,Songshan Lake Materials Laboratory,Dongguan Guangdong 523808;School of Materials Science and Engineering,Hunan University of Science and Technology,Xiangtan Hunan 411201;Quantum Science Center of Guangdong-HongKong-Macao Greater Bay Area,Shenzhen Guangdong 518000;Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]中国科学院金属研究所沈阳材料科学国家研究中心,辽宁沈阳110016 [2]中国科学技术大学材料科学与工程学院,辽宁沈阳110016 [3]松山湖材料实验室大湾区显微科学与技术研究中心,广东东莞523808 [4]湖南科技大学材料科学与工程学院,湖南湘潭411201 [5]粤港澳大湾区量子科学中心,广东深圳518000 [6]中国科学院物理研究所,北京100190

出　　处：《电子显微学报》2024年第5期549-556,共8页Journal of Chinese Electron Microscopy Society

基　　金：中国科学院金属研究所创新基金资助项目(No.2024-ZD01).

摘　　要：结合透射电子显微镜和多模式原子力显微镜技术,本文探索研究了生长在Nb:SrTiO_(3)上的BiFeO_(3)⁃NiFe_(2)O_(4)复合薄膜的微观结构和磁电耦合性能。衍衬分析和选区电子衍射表明BiFeO_(3)和NiFe_(2)O_(4)在沉积过程中发生相分离并自组装外延生长形成纳米复合结构。进一步利用像差校正透射电子显微镜揭示了BiFeO_(3)与NiFe_(2)O_(4)两相间的界面和相分离细节;BiFeO_(3)基体中存在大量的层状缺陷和氧空位片,造成局部晶格膨胀和复杂的极化分布。多模式原子力显微镜测量证明了复合薄膜具有良好的铁电翻转和保持性能,以及较低的漏电流和明显的磁电耦合。本工作呈现了一种自组装复合多铁材料的制备与表征,期望为未来微电子器件设计提供借鉴和指导。Utilizing transmission electron microscopy and multimodal atomic force microscopy,we investigated the microstructure and magnetoelectric coupling of BiFeO_(3)⁃NiFe_(2)O_(4)composite films grown on Nb:SrTiO_(3).TEM diffraction contrast images and selected area electron diffraction revealed that BiFeO_(3)and NiFe_(2)O_(4)underwent phase separation and self⁃assembly during the epitaxial growth process.Furthermore,aberration⁃corrected transmission electron microscopy provided detailed insights into the BiFeO3⁃NiFe_(2)O_(4)interface and phase separation,as well as the presence of numerous layered defects and oxygen vacancy planes within the BiFeO_(3)matrix.These structural features led to local lattice expansion and a complex spontaneous polarization distribution.Multimodal atomic force microscopy measurements demonstrated the composites films’excellent ferroelectric polarization switching and retention,along with low leakage current and significant magnetoelectric coupling.This work presented the preparation and characterization of self⁃assembled BiFeO_(3)⁃NiFe_(2)O_(4)composite multiferroic films,providing a valuable reference and guidance for the design of novel microelectronic devices.

关 键 词：多铁性复合薄膜 自组装 像差校正电子显微学 磁电耦合 

分 类 号：TB383[一般工业技术—材料科学与工程] O77[理学—晶体学] TG115.215.3[金属学及工艺—物理冶金]