Simulation of mode transitions in capacitively coupled Ar/O_(2) plasmas  

作　　者：Xiangmei LIU Shuren ZHANG Shuxia ZHAO Hongying LI Xiaohui REN 刘相梅;张树人;赵书霞;李洪影;任晓辉(School of Science,Qiqihar University,Qiqihar 161006,People’s Republic of China;School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China)

机构地区：[1]School of Science,Qiqihar University,Qiqihar 161006,People’s Republic of China [2]School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China

出　　处：《Plasma Science and Technology》2024年第11期96-106,共11页等离子体科学和技术（英文版）

基　　金：supported by National Natural Science Foundation of China(Nos.11805107 and 12275039);the Fundamental Research Funds in Heilongjiang Provincial Universities of China(No.145309625)。

摘　　要：In this work,the effects of the frequency,pressure,gas composition,and secondary-electron emission coefficient on the discharge mode in capacitively coupled Ar/O_(2) plasmas were carefully studied through simulations.Three discharge modes,i.e.,α,γ,and drift-ambipolar(DA),were considered in this study.The results show that a mode transition from theγ-DA hybrid mode dominated by theγmode to the DA-αhybrid mode dominated by the DA mode is induced by increasing the frequency from 100 k Hz to 40 MHz.Furthermore,the electron temperature decreases with increasing frequency,while the plasma density first decreases and then increases.It was found that the electronegativity increases slightly with increasing pressure in the lowfrequency region,and it increases notably with increasing pressure in the high-frequency region.It was also observed that the frequency corresponding to the mode transition fromγto DA decreased when the secondary-electron emission coefficient was decreased.Finally,it was found that increasing the oxygen content weakens theγmode and enhances the DA mode.More importantly,the density of oxygen atoms and ozone will increase greatly with increasing oxygen content,which is of great significance for industrial applications.

关 键 词：mode transition processing parameters Ar/O_(2)discharges 

分 类 号：O53[理学—等离子体物理]