Preparation and Properties of Cu-Containing High-entropy Alloy Nitride Films by Magnetron Sputtering on Titanium Alloy  

作　　者：DENG Wanrong YANG Wei YU Sen LAN Nan MA Xiqun WANG Liqun GAO Wei CHEN Jian 邓婉蓉;杨巍

机构地区：[1]School of Material Science and Chemical Engineering,Xi’an Technological University,Xi’an 710021,China [2]Shaanxi Key Laboratory of Biomedical Metal Materials,Northwest Institute for Non-ferrous Metal Research,Xi’an 710016,China [3]School of Materials Science and Engineering,Xi’an Jiaotong University,Xi’an 710049,China

出　　处：《Journal of Wuhan University of Technology(Materials Science)》2024年第6期1586-1594,共9页武汉理工大学学报（材料科学英文版）

基　　金：Funded by the National Natural Science Foundation of China(No.52071252);the Key Research and Development Plan of Shaanxi Province Industrial Project(Nos.2021GY-208,2022GY-407,and 2021ZDLSF03-11);the China Postdoctoral Science Foundation(No.2020M683670XB)。

摘　　要：Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field.

关 键 词：titanium alloy high-entropy alloy nitride film magnetron sputtering properties 

分 类 号：TG174.4[金属学及工艺—金属表面处理]