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作 者:Zhongyu WANG Jing MIN Jing HU Zehan WANG Xiuguo CHEN Zirong TANG Shiyuan LIU
机构地区:[1]State Key Laboratory of Intelligent Manufacturing Equipment and Technology,Huazhong University of Science and Technology,Wuhan 430074,China [2]Optics Valley Laboratory,Wuhan 430074,China
出 处:《Frontiers of Mechanical Engineering》2024年第5期59-71,共13页机械工程前沿(英文版)
基 金:funded by the National Natural Science Foundation of China(Grant Nos.52375541,52022034,52130504,and 62175075);the National Key Research and Development Plan of China(Grant No.2022YFF0709104);the Key Research and Development Plan of Hubei Province,China(Grant No.2020BAA8);the Interdisciplinary Research Program of Huazhong University of Science and Technology,China(Grant No.2023JCYJ047);the Innovation Project of Optics Valley Laboratory,China(Grant No.OVL2023PY003).
摘 要:Photoacoustic detection has shown excellent performance in measuring thickness and detecting defects in metal nanofilms.However,existing research on ultrafast lasers mainly focuses on using picosecond or nanosecond lasers for large-scale material processing and measurement.The theoretical study of femtosecond laser sources for photoacoustic nondestructive testing(NDT)in nanoscale thin film materials receives much less emphasis,leading to a lack of a complete physical model that covers the entire process from excitation to measurement.In this study,we developed a comprehensive physical model that combines the two-temperature model with the acoustic wave generation and detection model.On the basis of the physical model,we established a simulation model to visualize the ultrafast lasermaterial interaction process.The damage threshold of the laser source is determined,and the effect of key parameters(laser fluence,pulse duration,and wavelength)for AlCu nanofilms on the femtosecond photoacoustic NDT process is discussed using numerical results from the finite element model.The numerical results under certain parameters show good agreement with the experimental results.
关 键 词:femtosecond photoacoustic nondestructive testing metal nanofilm ultrafast laser-matter interaction modeling and simulation semiconductor manufacturing
分 类 号:TN24[电子电信—物理电子学] TB383[一般工业技术—材料科学与工程]
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