石英微透镜的制备及其测试技术研究  

Study on Fabrication and Characterization of Quartz Microlens Array

作　　者：刘丹 乌李瑛 张文昊 盛嘉平 程秀兰 LIU Dan;WU Liying;ZHANG Wenhao;SHENG Jiaping;CHENG Xiulan(Center for Advanced Electronic Materials and Devices,School of Electronic Information and Electrical Engineering,Shanghai Jiao Tong University,Shanghai 200240,CHN)

机构地区：[1]上海交通大学电子信息与电气工程学院先进电子材料与器件平台,上海200240

出　　处：《半导体光电》2024年第5期744-750,共7页Semiconductor Optoelectronics

基　　金：国家科技部“十四五”重点研发计划“高性能免疫现场检测系统研发”项目(2023YFC2413001);上海市科技创新行动计划项目(22501100800);国家自然科学基金重点项目(62335014);上海交通大学决策咨询重点课题实验技术专项项目(JCZXSJA2023-05).

摘　　要：提出一种利用光刻胶热熔和等离子体刻蚀技术相结合的石英微透镜阵列的制备工艺。详细研究了热熔和感应耦合等离子体刻蚀等关键工艺,并确定了最佳工艺参数。最终在石英衬底上制备了不同尺寸和形状的微透镜阵列。微透镜的几何形貌和光学性能测试结果表明,所制备的石英微透镜阵列具有很好的尺寸一致性,并且表面质量高,测试焦距与理论计算值相吻合。该方法制备的石英微透镜阵列具有良好的成像性能,可广泛应用于光学领域。This study presents the fabrication process of quartz microlens arrays(MLAs)using a combination of photoresist thermal reflow and plasma etching techniques.Key fabrication steps,including thermal reflow and inductively coupled plasma reactive ion etching(ICP-RIE),were investigated in detail.The optimal process parameters were determined,enabling the preparation of quartz MLAs in various sizes and shapes.The geometrical morphology and optical properties of the fabricated MLAs were evaluated,showing high uniformity and excellent surface quality.The measured focal lengths were found to be in close agreement with theoretical predictions.The results demonstrate that the fabricated MLAs exhibit excellent imaging performance,making them highly suitable for various optical applications.

关 键 词：微透镜阵列 石英 热熔 电感耦合等离子体刻蚀 光学性能 

分 类 号：TN305.7[电子电信—物理电子学]