CuGa_(2)前驱体合金的制备和去合金化过程中纳米多孔铜的形成  

Preparation of Precursor CuGa 2 Alloy and Formation of Nanoporous Copper during Dealloyed

作　　者：周玉鑫 胡劲[1] 朱家军 王开军[1] 段云彪[1] 张维钧[1] ZHOU Yuxin;HU Jin;ZHU Jiajun;WANG Kaijun;DUAN Yunbiao;ZHANG Weijun(School of Materials Science and Engineering,Kunming University of Science and Technology,Kunming 650093,China;Yunnan Zhongxuan Liquid Metal Technology Co.,Ltd.,Qujing 655400,China)

机构地区：[1]昆明理工大学材料科学与工程学院,云南昆明650093 [2]云南中宣液态金属科技有限公司,云南曲靖655400

出　　处：《材料科学与工程学报》2024年第5期782-789,共8页Journal of Materials Science and Engineering

摘　　要：在220℃的加热条件下制备前驱体CuGa_(2)合金,运用化学腐蚀与电化学腐蚀两种去合金方法制备纳米多孔铜,分析不同浓度的腐蚀介质对多孔结构形成的影响,并分别用扫描电子显微镜(SEM)、X射线衍射(XRD)、能量色散X射线光谱(EDS)和电感耦合等离子体质谱仪(ICP-Ms)分析样品的相组成和微观形貌。结果表明,合金化过程中以甲基硅油作为防氧化保护介质可获得前驱体CuGa_(2)合金;不同腐蚀介质对纳米多孔铜的形成有显著影响。在电化学腐蚀过程中,由于不同溶液中Cu,Ga与CuGa_(2)的平衡电位不同对纳米多孔铜的形成影响显著,1M HCl溶液中CuGa_(2)的平衡电位与Cu的平衡电位相近,Ga、Cu原子会共同溶解导致无法形成多孔结构;1M NaOH溶液中Cu与CuGa_(2)的平衡电位的电位差较大,可进行充分腐蚀获得多孔结构,形成的多孔孔隙分布杂乱且不均匀,孔径范围为120 nm~1μm。前驱体合金经1M HCl溶液的化学腐蚀,由于H^(+)的腐蚀作用,Cl^(-)促进Cu原子的扩散重排,获得的多孔纳米铜形貌与结构更加清晰均匀且连续,其孔径范围为20~100 nm。The precursor CuGa_(2) alloy was prepared at 220℃,and nanoporous copper was prepared by chemical and electrochemical dealloying methods.The effects of different concentrations of different corrosion media on the formation of porous structures were studied,and the phase composition and morphology of the samples were analyzed by SEM,XRD,EDS and ICP-Ms.The results show that the precursor CuGa_(2) alloy can be obtained by using methyl silicone oil as the oxidation protection medium in the alloy process.The formation of nanoporous copper was significantly affected by the different corrosion media.In the electrochemical corrosion process,the formation of nanoporous copper is significantly affected by the different equilibrium potentials of Cu,Ga and CuGa_(2) in different solutions.The equilibrium potential of CuGa_(2) in 1M HCl is close to the equilibrium potential of Cu,and Ga and Cu atoms will dissolve together,resulting in the inability to form porous structures.The potential difference between the equilibrium potential of Cu and CuGa_(2) in 1M NaOH solution is large,which can be fully corroded to obtain a porous structure,forming a porous pore with a disorder and uneven distribution,and the pore size range is 120 nm to 1μm.Due to the corrosion effect of H^(+),Cl^(-)promotes the diffusion rearrangement of Cu atoms in hydrochloric acid solution of chemical corrosion.The porous morphology and structure obtained in 1M HCl solution are more clear,uniform and continuous,and the pore size ranges from 20 to 100 nm.

关 键 词：合金化 CuGa 2合金 腐蚀介质 去合金 纳米多孔铜 

分 类 号：TG146.11[一般工业技术—材料科学与工程]