极紫外与X射线高精度薄膜光学系统关键技术及应用  

Technology development and applications of high precision extreme ultraviolet and X-ray thin film optical systems

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作  者:王占山[1,2,3] 黄秋实 伊圣振[1,2,3] 张众 齐润泽[1,2,3,4] 余俊 张哲[1,2,3] 李文斌[1,2,3] 盛鹏峰 余越 蒋励[1,2,3] WANG ZhanShan;HUANG QiuShi;YI ShengZhen;ZHANG Zhong;QI RunZe;YU Jun;ZHANG Zhe;LI WenBin;SHENG PengFeng;YU Yue;&JIANG Li(Institute of Precision Optical Engineering Technology,School of Physical Science and Engineering,Tongji University,Shanghai 200092,China;Key Laboratory of Advanced Microstructured Materials MOE,Shanghai 200092,China;Shanghai Full-Spectrum High-Performance Optical Thin Film Devices and Application Professional Technical Service Platform,Shanghai 200092,China;Zhejiang Tongyue Optical Technology Co.,Ltd.Huzhou 313100,China)

机构地区:[1]同济大学精密光学工程技术研究所,物理科学与工程学院,上海200092 [2]先进微结构材料教育部重点实验室,上海200092 [3]上海市全光谱高性能光学薄膜器件及应用专业技术服务平台,上海200092 [4]浙江同越光学科技有限公司,湖州313100

出  处:《中国科学:物理学、力学、天文学》2024年第11期2-14,共13页Scientia Sinica Physica,Mechanica & Astronomica

基  金:国家重点研发计划(编号:2023YFA1608600,2022YFF0709100);国家自然科学基金(编号:12235011,12075170)资助项目。

摘  要:极紫外与X射线(XUV)光学系统在物质微观结构探测和高能物理等前沿科学和重大工程方面有重要应用.本文建立了XUV薄膜表界面散射/反射的理论计算模型,发展了融合器件性能与系统结构误差的XUV光线追迹仿真方法;创建了XUV纳米多层膜界面缺陷解耦表征和生长调控方法,发展了数百毫米尺寸-几十皮米精度的多层膜镀制技术,研制了高效率XUV多层膜光栅新元件;发展了XUV掠入射和正入射成像系统的高精度集成装调技术,研制了系列X射线多通道KB成像和极紫外成像系统,成功应用于我国激光惯性约束聚变、同步辐射大科学装置和太阳观测任务等.Driven by the requirements of microscale observation of matters structure and high energy physics on extreme ultraviolet and X-ray(XUV)systems,our team has performed over 20 years study of the fundamental physics and technology in the XUV thin film optics and systems.The theoretical models for calculation of X-ray scattering/reflection from thin film interfaces were built and the simulation methods for system performance including the thin film opics quality and integrating errors were developed.To fabricate high quality XUV thin film optics,comprehensive structure charaterzation and growth modulation methods were developed;coating techniques with tens of picometers accuracy over hundreds of millimeters area were also developed.New types of XUV multilayer gratings with high efficiency were proposed and demonstrated.Based on these,high precision integration techniques were developed for the fabrication of normal incidence and grazing incidence XUV systems.These optics and systems have been successfully installed and applied in the laser confinement fusion,synchrotron radiation faclities,and solar observation payload.This paper will briefly introduce the above-mentioned results in our team.

关 键 词:极紫外与X射线 多层膜 光学系统 

分 类 号:O484.41[理学—固体物理]

 

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