Effects of external parameters on plasma characteristics and uniformity in a dual cylindrical inductively coupled plasma  

作　　者：Pengyu WANG Siyu XING Daoman HAN Yuru ZHANG Yong LI Cheng ZHOU Fei GAO Younian WANG 王鹏宇;邢思雨;韩道满;张钰如;李永;周成;高飞;王友年(Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China;Lab of Advanced Space Propulsion and Beijing Engineering Research Center of Efficient and Green Aerospace Propulsion Technology,Beijing Institute of Control Engineering,Beijing 100190,People’s Republic of China)

机构地区：[1]Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams(Ministry of Education),School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China [2]Lab of Advanced Space Propulsion and Beijing Engineering Research Center of Efficient and Green Aerospace Propulsion Technology,Beijing Institute of Control Engineering,Beijing 100190,People’s Republic of China

出　　处：《Plasma Science and Technology》2024年第12期63-74,共12页等离子体科学和技术（英文版）

基　　金：financially supported by National Natural Science Foundation of China(Nos.12075049 and 11935005)。

摘　　要：The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower chamber.In this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)discharge.The effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were analyzed.The results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main chamber.As the remote power increased,plasma uniformity improved initially and then deteriorated.The main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main chamber.The gas pressure affected both the uniformity and density of the plasma.As the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved.

关 键 词：dual inductively coupled plasma remote plasma plasma uniformity fluid model 

分 类 号：O53[理学—等离子体物理]