过渡金属催化卤硅烷转化构建硅碳键反应研究进展  

Research Progress of Transition Metal-catalyzed Halosilane Conversion to Construct Si-C Bond Reaction

作　　者：王雪松 曹建[1] WANG Xuesong;CAO Jian(Key Laboratory of Organosilicon Chemistry and Material Technology of Ministry of Education,College of Material,Chemistry and Chemical Engineering,Hangzhou Normal University,Hangzhou 311121,China)

机构地区：[1]杭州师范大学材料与化学化工学院有机硅化学及材料技术教育部重点实验室,浙江杭州311121

出　　处：《杭州师范大学学报（自然科学版）》2024年第6期627-642,651,共17页Journal of Hangzhou Normal University(Natural Science Edition)

基　　金：国家级大学生创新创业训练计划项目(202310368050).

摘　　要：有机硅化合物在有机合成中具有广泛的应用,开发在分子中引入硅原子的高效方法备受关注.文章从格氏试剂促进反应、silyl-Heck反应、silyl-Negishi反应、过渡金属催化下的交叉偶联反应等方面对近20年硅碳键的构建研究进行了综述,发现硅卤键键能较高是利用卤硅烷构建硅碳键时存在的主要问题.因此,扩展氯硅烷的底物范围,开发更为有利的反应条件将是未来需要探讨的话题.Organosilicon compounds are extensively utilized in organic synthesis,and the development of efficient methodologies for incorporating silicon atoms into molecules has attracted significant attention.This paper provides a comprehensive review of research conducted over the past two decades on the construction of Si-C bond,focusing on three key aspects:form reagent promotion reactions,silyl-Heck and silyl-Negishi reactions,as well as cross-coupling reactions catalyzed by transition metals.It was observed that the high bonding energy associated with Si-C bonds poses a major challenge when utilizing halosilanes for their construction.Consequently,expanding the substrate range of chlorosilanes and exploring more favorable reaction conditions will be topics warranting further discussion in future studies.

关 键 词：过渡金属 卤硅烷 Si-C键合成 Si-X键断裂 

分 类 号：TQ426.6[化学工程]