基于激光诱导等离子体的Mach⁃Zehnder干涉法测量气体介质恢复特性的研究  

Research on Gaseous Medium Recovery Characteristics Measurement by Mach⁃Zehnder Interferometry Based on Laser⁃induced Plasma

作　　者：陈介夫 孙昊[1] 李刚 吴翊[1] 高文 刘广义 CHEN Jiefu;SUN Hao;LI Gang;WU Yi;GAO Wen;LIU Guangyi(Xi’an Jiaotong University,Xi’an 710049,China;Xi’an High Voltage Electrical Research Institute Co.,Ltd.,Xi’an 710077,China)

机构地区：[1]西安交通大学,西安710049 [2]西安高压电器研究院股份有限公司,西安710077

出　　处：《高压电器》2024年第12期199-205,共7页High Voltage Apparatus

基　　金：国家重点研发计划资助项目(2022YFB2403600);国家自然科学基金项目(U22B20121);国家自然科学基金委面上项目(52077170)。

摘　　要：在高压电器中,灭弧气体的应用十分广泛,气体的灭弧性能与其恢复特性息息相关。对于气体介质的灭弧性能测量,已有理论研究中的建模仿真方法以及一些直接或间接的测量电子密度的手段都存在较明显的缺点。为解决这一问题,文中通过Mach⁃Zehnder干涉法可以较为精确地测量出弧后各时间点的电子密度这一研究气体介质恢复特性的关键参数。同时考虑到断路器结构下新型气体介质测量成本高昂,文中设计了基于激光诱导等离子的气体介质恢复特性测量实验。通过该实验,对SF_(6)、CO_(2)和N_(2)的电子密度衰减特性进行测量,其电子密度的衰减速率特征值为SF(61)>CO(20.77)>N(20.72),并与已有结论进行对比,验证了该方法的可行性。Arc extinguishing gas is used widely in high voltage apparatus,and arc extinguishing performance of the gas is closely related to its recovery performance.As for the measurement of arc extinguishing performance of gas medium,there are obvious shortcomings in modeling and simulation methods and some direct or indirect methods for measuring electron density.For solving this problem,the use of Mach⁃Zehnder interferometry can accurately measure the electron density at each time point behind the arc,which is a key parameter for studying the recovery characteristics of gas medium.At the same time,considering the high cost of the new gas medium measurement un⁃der the circuit breaker structure,a laser induced plasma based gas medium recovery characteristics measurement experiment is designed in this paper.Through this experiment,the electron density attenuation characteristics of SF_(6),CO_(2)and N_(2)are measured,the characteristic value of decay rate of electron density is SF(61)>CO(20.77)>N_(2)(0.72),and the feasibility of the proposed method is verified by comparing with the existing conclusion.

关 键 词：激光诱导等离子体 Mach⁃Zehnder干涉法 电子密度 气体介质恢复特性 

分 类 号：TM213[一般工业技术—材料科学与工程] O53[电气工程—电工理论与新技术] TN249[理学—等离子体物理]