X荧光玻璃熔片法分析锰硅合金的应用  

Application of X-ray Fluorescence Glass Melting Plate Method for Analyzing Manganese Silicon Alloy

作　　者：杨鹏 高小龙 刘小明 王江华 Yang Peng;Gao Xiaolong;Liu Xiaoming;Wang Jianghua(Quality Inspection Center of Shanxi Zhongyang Iron and Steel Co.,Ltd.,Lvliang Shanxi 033400,China)

机构地区：[1]山西中阳钢铁有限公司质检中心,山西吕梁033400

出　　处：《山西化工》2024年第11期96-99,共4页Shanxi Chemical Industry

摘　　要：化学分析方法分析锰硅合金中硅、锰、磷等成分时步骤繁琐,分析速度慢,人为误差多,无法满足生产的需要;采用X荧光玻璃熔片法更加便捷,通常采用直接熔融法分析锰硅合金时能够对铂金坩埚形成腐蚀,同行业中采用无水四硼酸锂挂壁后氧化方式进行分析,对人员操作要求较高。本方法通过无水四硼酸锂衬底,硼酸及碳酸锂作氧化剂,在700~900℃范围内进行氧化处理,将其中的硅、锰、磷单质进行氧化变为氧化态,进而避免坩埚的腐蚀,实现熔片快速分析。通过本方法的应用,能够大幅提高分析效率,且过程简单,准确度高,便于推广,同时可减少各类腐蚀性危险化学药品的使用,适应企业快节奏的生产需求。The chemical analysis method is cumbersome for examining of silicon,manganese,phosphorus and other components in manganese-silicon alloy,however,the analysis speed is slow,and the human error is relatively large,which can't meet the needs of production.The use of X-ray fluorescence glass melting method is more convenient.When using direct melting method to analyze manganese silicon alloy,it can cause corrosion to platinum crucibles.Anhydrous lithium tetraborate wall hanging and oxidation method is used for analysis,which requires high personnel operation requirements within the same field.In this research,anhydrous lithium tetraborate are used as substrate,boric acid and lithium carbonate as oxidants,and oxidation treatment is carried out in the range of700~900 ℃,meanwhile the silicon,manganese and phosphorus elements are oxidized into oxidized state for avoiding the corrosion of the crucible and realize the rapid analysis of the fused piece.This method can greatly improve the analysis efficiency with simple process and high accuracy,it is easy to promote,meanwhile it can reduce the various corrosive and dangerous chemicals,furthermore the fast-paced production needs of enterprises can be adapted.

关 键 词：X射线荧光 无水四硼酸锂 玻璃熔片 锰硅合金 

分 类 号：TG115[金属学及工艺—物理冶金]