Elastodynamic behaviors of steady moving straight dislocation within thin nano film  

作　　者：Ran Tao Yehui Hong Zheyu Li Wenwang Wu 

机构地区：[1]Institute of Advanced Structure Technology,Beijing Institute of Technology,Beijing 100081,China [2]Suzhou laboratory,Suzhou 215028,China

出　　处：《Theoretical & Applied Mechanics Letters》2024年第5期360-370,共11页力学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China(Grant Nos.68917557 and 11972081)。

摘　　要：The elastodynamic dislocation behaviors are of great interest for understanding the performances of structural alloys under intense dynamic loading conditions.The formation,propagations,and interactions of dislocations(such as injected dislocation,accelerating dislocation,steady moving dislocation at high constant speed)are quite different from static dislocations.For steady-moving dislocation within the isotropic infinite medium,the effects of surface and interface on steady-moving dislocations within limited space are still known.In this paper,we investigate the elastodynamic image stress simulation of steady moving dislocation within film of limited thickness at constant speed using Eigenstrain theory,Lorentz transformation,and steady dynamic equilibrium equations.We propose an efficient solution method that involves complex Fourier series,transforming partial differential equations into ordinary differential equations,and ultimately into a set of algebraic equations in spectral space.The effects of dislocation speed and position near the free surface on the image stress of steady-moving climbing and gliding dislocations within the thin film are examined.The results show that relativistic effects are significant for certain dislocation configurations and stress components,whereas other stress components are less sensitive to relativistic effects near the transonic speed region.

关 键 词：Elastodynamic Image stress DISLOCATION Thin film 

分 类 号：TB383.2[一般工业技术—材料科学与工程] O341[理学—固体力学]