Electromagnetic modeling of interference,confocal,and focus variation microscopy  

作　　者：Tobias Pahl Felix Rosenthal Johannes Breidenbach Corvin Danzglock Sebastian Hagemeier Xin Xu Marco Künne Peter Lehmann 

机构地区：[1]University of Kassel,Faculty of Electrical Engineering and Computer Science,Measurement Technology Group,Kassel,Germany

出　　处：《Advanced Photonics Nexus》2024年第1期104-116,共13页先进光子学通讯（英文）

基　　金：support of the following research Projects (Nos.GZ:LE 992/14-3 and LE 992/18-1)by the Deutsche Forschungsgemeinschaft and the EMPIR program (project TracOptic,20IND07)co-financed by the European Union’s Horizon 2020 Research and Innovation Program.

摘　　要：We present a unified electromagnetic modeling of coherence scanning interferometry,confocal microscopy,and focus variation microscopy as the most common techniques for surface topography inspection with micro-and nanometer resolution.The model aims at analyzing the instrument response and predicting systematic deviations.Since the main focus lies on the modeling of the microscopes,the light–surface interaction is considered,based on the Kirchhoff approximation extended to vectorial imaging theory.However,it can be replaced by rigorous methods without changing the microscope model.We demonstrate that all of the measuring instruments mentioned above can be modeled using the same theory with some adaption to the respective instrument.For validation,simulated results are confirmed by comparison with measurement results.

关 键 词：interference microscopy coherence scanning interferometry confocal microscopy focus variation microscopy electromagnetic modeling surface topography measurement 

分 类 号：TB3[一般工业技术—材料科学与工程]