Plasma induced dynamic coupling of microscopic factors to collaboratively promote EM losses coupling of transition metal dichalcogenide absorbers  

作　　者：Jiaming Wen Geng Chen Shengchong Hui Zijing Li Jijun Yun Xiaomeng Fan Limin Zhang Qian He Xingmin Liu Hongjing Wu 

机构地区：[1]MOE Key Laboratory of Material Physics and Chemistry under Extraordinary,School of Physical Science and Technology,Northwestern Polytechnical University,Xi'an710072,China [2]School of Material Science and Engineering,Northwestern Polytechnical University,Xi'an 710072,China [3]Frontiers Science Center for Deep Ocean Multispheres and Earth System,and Key Laboratory of Marine Chemistry Theory and Technology,Ministry of Education,Ocean University of China,Qingdao 266100,China [4]Institute of Materials Science,Technische Universitӓt Darmstadt,Alarich-Weiss-Str.2,64287,Darmstadt,Germany

出　　处：《Advanced Powder Materials》2024年第3期1-11,共11页先进粉体材料（英文）

基　　金：support was provided by the National Science Foundation of China(Grants nos.51872238,52074227 and 21806129);the Fundamental Research Funds for the Central Universities(Nos.3102018zy045 and 3102019AX11);the Natural Science Basic Research Plan in Shaanxi Province of China(Nos.2017JQ5116 and 2020JM-118).

摘　　要：Plasma as the fourth state of matter has attracted great attention for material surface modification,which could induce changes in material microscopic factors,such as defects,phase transitions,crystallinity,and so on.However,the interactions among those microscopic factors and regulation mechanism of macroscopic properties have rarely been investigated.Two-dimensional(2D)transition metal dichalcogenide with tunable structure and phase is one of the most promising electromagnetic wave(EMW)absorbers,which provides a favorable platform for systematically studying the dynamic coupling of its microscopic factors.Herein,we constructed a NaBH_(4) solution-assisted Ar plasma method to modify the 2H-MoS_(2)and 1T-WS_(2)for exploring the regulation mechanism of microscopic factors.For MoS_(2)and WS_(2),NaBH_(4) solution-assisted Ar plasma treatment behaves with different effects on dielectric responses,realizing dynamic coupling of material microscopic factors to collaboratively promote EM losses coupling.Consequently,the MS-D3-0.5(MoS_(2),3 kV voltage,0.5 mol L^(-1)NaBH_(4) solution)displays an optimum effective absorption bandwidth of 8.01 GHz,which is 319.4%more than that of MS-raw sample.This study not only reveals the novel mechanism of plasma induced dynamic coupling of microscopic factors for EMW dissipation,but also presents a new method of plasma-dominated surface modification to optimize the EMW absorption performance.

关 键 词：TMDS Ar plasma Defect Metal single atom Dynamic coupling 

分 类 号：TG1[金属学及工艺—金属学]