Retarding the effect of Ta on high-temperature oxidation of sputtered nanocrystalline coatings  

作　　者：Bo Meng Lanlan Yang Qunchang Wang Jinlong Wang Minghui Chen Shenglong Zhu Fuhui Wang 

机构地区：[1]Shenyang National Laboratory for Materials Science,Northeastern University,Shenyang 110819,China [2]School of Materials Science and Engineering,Jiangsu University of Science and Technology,Zhenjiang 212003,China [3]Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China

出　　处：《Journal of Materials Science & Technology》2024年第17期195-206,共12页材料科学技术（英文版）

基　　金：supported by the National Natural Science Foundation of China under Grant Nos.51671053 and 51801021;the Fundamental Research Funds for the Central Universities(No.N2302007);the Ministry of Industry and Information Technology Project(No.MJ-2017-J-99).

摘　　要：The presence of excess Ta in high-temperature protective coatings can compromise the integrity of the Al_(2)O_(3)scale on the surface,which has a negative impact on the oxidation behavior and reduces the service life.The effects of oxygen doping on the isothermal oxidation of three sputtered nanocrystalline coatings were investigated at 1100°C.The results indicated that oxygen doping inhibited the diffusion of Ta from the coating to the oxide scale,which was primarily attributed to the preferential oxidation of the Al in the coating.However,excess oxygen doping decreased the amount of Al available for the formation of the Al_(2)O_(3)scale on the coating,thus reducing the inhibitory effect on Ta oxidation.Moreover,doping with excess O caused spalling of the oxide scale.Therefore,the right balance in O doping is crucial for suppressing Ta oxidation while maintaining the integrity of the oxide scale.

关 键 词：High-temperature oxidation Oxygen doping Nanocrystalline coating Ta-rich phase Residual stress 

分 类 号：TG174.4[金属学及工艺—金属表面处理]