不同基板中硅含量对镀锌产品抑制层的影响  

Effect of silicon content in different substrates on the inhibitory layer of galvanized products

作　　者：王刚[1] 许丽丽 申丹 刘洪磊 王栋 Wang Gang;Xu Lili;Shen Dan;Liu Honglei;Wang Dong(Rizhao Iron and Steel Holding Group Co.,Ltd.,Technical Quality Department,Rizhao 276806,China;Rizhao City Lanshan District Science and Technology Bureau,Rizhao 276806,China)

机构地区：[1]日照钢铁控股集团有限公司技术质量处,山东日照276806 [2]日照市岚山区科学技术局,山东日照276806

出　　处：《冶金标准化与质量》2024年第6期19-23,共5页Metallurgical Standardization & Quality

摘　　要：为研究基板不同Si含量对镀锌产品抑制层的影响,针对2种不同Si含量的DX51D+Z、SGH440进行对比分析。在热轧及镀锌工艺相近的前提下,通过HCl溶液及酒精洗去试样表明纯锌层,通过SEM扫描电镜及能谱检验进行对比分析。分析结果证实,Si含量0.035%的DX51D+Z锌层抑制层完整而致密;而Si含量0.2%的SGH440氧化物在晶界的偏析更加严重,锌层抑制层呈断续状,这是由于表明Si的氧化物难以被有效Al还原造成的。In order to study the influence of different Si contents on the inhibition layer of galvanized products,the DX51D+Z、SGH440 with two different Si contents were compared and analyzed.Under the premise of similar hot-rolling and galvanizing processes,the samples were washed by HCl solution and alcohol to show the pure zinc layer,and then compared and analyzed by SEM and EDS.The analysis results confirmed that the DX51D+Z zinc-inhibiting layer with Si content of 0.035%was intact and dense.However,the segregation of the oxide of SGH440 with Si content of 0.2%was more serious at grain boundary,and the zinc inhibition layer was intermittent,which was caused by the fact that the oxide of Si was difficult to be effectively reduced by Al.

关 键 词：热镀锌 不同Si含量 抑制层形貌 抑制层晶粒度 

分 类 号：TG174[金属学及工艺—金属表面处理]