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作 者:张衡[1] 陈昆峰 薛冬峰 ZHANG Heng;CHEN Kunfeng;XUE Dongfeng(Institute of Novel Semiconductors,State Key Laboratory of Crystal Materials,Shandong University,Jinan 250100,China;Shenzhen Institute for Advanced Study,University of Electronic Science and Technology of China,Shenzhen 518110,China)
机构地区:[1]山东大学新一代半导体材料研究院晶体材料国家重点实验室,山东济南250100 [2]电子科技大学(深圳)高等研究院,广东深圳518110
出 处:《无机盐工业》2024年第12期1-12,共12页Inorganic Chemicals Industry
基 金:济南市市校融合发展战略工程项目(JNSX2023103);国家自然科学基金重点国际(地区)合作与交流项目(2220105010)。
摘 要:钽铌金属广泛应用于集成电路、航空航天、汽车、超导等领域,是不可或缺的战略材料。首先,介绍了钽铌资源分布、湿法冶金和高纯材料制备的内容,分析了国内外现状。文章指出世界钽铌资源主要分布在巴西、加拿大、澳大利亚和非洲地区等国家,中国钽铌资源品位低难利用,高度依赖进口。钽铌的湿法冶金方法分为碱法、酸法和氯化法,碱法有碱熔法和碱性水热法,酸法有硫酸法和氢氟酸法。而高纯氧化物的制备须经历浸出、萃取、分离提纯、过滤洗涤和煅烧过程。其次,阐述了利用真空电子束熔炼制备高纯钽铌和金属中杂质元素去除的方法,该法可使钽纯度在5 N(99.999%)以上,铌纯度在4 N(99.99%)以上。最后,对高纯钽铌原料在集成电路、人工晶体生长等领域的应用及需求进行了介绍,对高纯钽铌制备技术及产品的国内外企业进行了分析对比,指出了未来高纯钽铌原料发展方向。Tantalum and niobium metals are indispensable strategic materials,which are widely used in integrated circuits,aerospace,automotive,superconductivity and other fields.The content about the resource distribution,hydrometallurgy,and the preparation of high purity of tantalum and niobium were introduced,and the technical status at home and abroad was analyzed.It was pointed out that the world's tantalum and niobium resource producing countries were Brazil,Canada,Australia,Africa,and other countries.The grade of tantalum and niobium resources in China was very low and highly dependent on imports.The hydrometallurgical methods for separating tantalum and niobium could be divided into alkali method,acid method and chlorination method.The alkali methods included alkali melting method and alkaline hydrothermal method.The acid methods included sulfuric acid method and hydrofluoric acid method.The preparation of high purity oxides must go through the process of leaching,extraction,separation and purification,filtration and washing and calcination.The method of preparing high purity tantalum and niobium by vacuum electron beam melting and the removal of impurities in the metal was also introduced.This method could achieve a purity over 99.999%(5 N)for tantalum and over 99.99%(4 N)for niobium.Finally,the application of high purity tantalum and niobium raw materials in integrated circuit,artificial crystal growth,and other fields was introduced.The preparation technology and products of high purity tantalum niobium were analyzed and compared with domestic and foreign enterprises.The development direction in future of tantalum and niobium raw materials was pointed out.
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