远紫外波段薄膜器件的研究进展(特邀)  

Research Progress of Thin Film Devices in the Far Ultraviolet(Invited)

作　　者：张锦龙[1,2,3,4] 李双莹 吴奇泽 焦宏飞 程鑫彬[1,2,3,4] 王占山 ZHANG Jinlong;LI Shuangying;WU Qize;JIAO Hongfei;CHEN Xinbin;WANG Zhanshan(Institute of Precision Optical Engineering,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China;MOE Key Laboratory of Advanced Micro-Structured Materials,Tongji University,Shanghai 200092,China;Shanghai Frontiers Science Center of Digital Optics,Shanghai 200092,China;Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications,Shanghai 200092,China)

机构地区：[1]同济大学精密光学工程技术研究所,上海200092 [2]同济大学先进微结构材料教育部重点实验室,上海200092 [3]同济大学上海市数字光学前沿科学研究基地,上海200092 [4]上海市全光谱高性能光学薄膜器件与应用专业技术服务平台,上海200092

出　　处：《光子学报》2024年第11期25-39,共15页Acta Photonica Sinica

基　　金：国家自然科学基金(Nos.61975155,61621001,62061136008);上海市科学技术委员会科技计划项目(Nos.20JC1414600,21JC1406100)。

摘　　要：远紫外波段在太阳物理学、天文和气象观测中都具有重要的科学意义和应用价值。远紫外薄膜器件是其中的基石和限制其性能的主要因素。本文介绍了远紫外波段薄膜材料的选择和光学常数的精确表征,回顾了宽带铝加氟化物反射薄膜保护薄膜技术的研究进展,介绍了远紫外波段窄带反射、透射薄膜的设计理念和制备技术,对远紫外波段薄膜材料、常用器件潜在的研究热点、发展趋势进行了展望。There has been significant progress in the research and development of Far Ultraviolet(FUV)thin film devices,driven by growing demands in astrophysics,geophysics,and other fields.However,most materials exhibit strong absorption in the FUV region,posing challenges for optical element design due to the limited material options.To address this issue,extensive research has been conducted on materials,structures,and fabrication processes.Aluminum(Al)mirrors are the primary components in FUV devices,and fluorides are commonly employed as protective layers to prevent Al from oxidizing.Al+LiF and Al+MgF_(2)mirrors have already been used in space telescopes like Far Ultraviolet Spectroscopic Explorer(FUSE)and Hubble Space Telescope(HST).The influence of deposition rate,substrate temperature,and protective layer thickness on the performance of these mirrors has been investigated.High-performance Al+eLiF(enhanced LiF)and Al+eMgF₂(enhanced MgF₂)m irrors were prepared by QUJIADA M A et al.using a three-step deposition method,which is currently considered a reliable approach to enhance the reflectivity of Al mirrors effectively.The absorption edge of LiF is about 105 nm,making it the transparent material with the shortest absorption edge known in nature,and a commonly used material for FUV short-wavelength band protective layers.However,LiF is hygroscopic,leading to poor time stability in Al+LiF mirrors.ANGEL D W et al.suggested that MgF_(2)could effectively slow down the aging of Al+LiF,which led to the development and validation of protected Al+LiF mirrors.Al+LiF+MgF₂and Al+LiF+AlF₃mirrors have significantly improved time stability compared to Al+LiF films.Fluoride materials known for their low absorption and high stability,such as MgF_(2),AlF₃,and LaF₃,have become prevalent in FUV reflective filters.By utilizing a multi-periodic dielectric structure with alternating high and low refractive index materials,(LaF_(3)/MgF_(2))ⁿreflective filters have been successfully fabricated,centered at wavelengths of 135.6 nm

关 键 词：远紫外 薄膜器件及应用 薄膜光学 光学常数 光学性质 

分 类 号：O484.4[理学—固体物理]