检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:Xue Li Zhenying Huang Hongjie Wang Wenqiang Hu Weici Zhuang Qun Yu Youbo Wu Qianwen Sun Yang Zhou Guangjin Chen Junji Mou Zhexuan Zhang
机构地区:[1]Institute of Materials Science and Engineering,School of Mechanical and Electronic Control Engineering,Beijing Jiaotong University,Beijing 100044,China [2]Tangshan Research Institute of Beijing Jiaotong University,Tangshan 063000,China
出 处:《Journal of Advanced Ceramics》2024年第10期1546-1552,共7页先进陶瓷(英文)
基 金:supported financially by the Beijing Natural Science Foundation(Nos.2212046,2234093,and L211001);the National Natural Science Foundation of China(Nos.51871011 and 51572017);the Research Fund for Commercialization of Major Scientific and Technological Achievements of Hebei Province(No.22281006Z);the Beijing Government Funds for the Constructive Project of Central Universities.
摘 要:Physical properties,such as electrochemical and electromagnetic properties,of two-dimensional MXenes can be improved by enhancing their stability.However,MXenes fabricated via acid etching contain defects,which affect their physical properties.In this study,a method to effectively remove Al residues using only water during MXene fabrication while maintaining structural stability is proposed.The fabrication and intercalation of MXenes are controlled via epitaxial self-intercalation of H_(2)O-etched Cr_(2)(AlLi)C.On the basis of this mechanism,the room-temperature ferromagnetism of two-dimensional few-layered Cr_(2)CT_(x)MXenes,which has a specific saturation magnetization of~0.26 emu/g and a Curie temperature of>353 K,is experimentally verified.The calculated electronic band structure implies that the semimetal Cr_(2)CT_(x)MXene has a band gap of 0.75 eV.This study opens new possibilities for the research and applications of industrial-scale manufacturing of MXenes and 2D semiconductors.
关 键 词:2D MXene room-temperature ferromagnetism H_(2)O-etched Cr_(2)(AlLi)C epitaxial self-intercalation semimetal
分 类 号:TG14[一般工业技术—材料科学与工程]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.33