一种微米柱透射电镜试样的制备方法  

A preparation method of micro-column transmission electron microscope sample

作　　者：张蕾 袁江淮 崔俊峰 段北晨 陈国新[1] ZHANG Lei;YUAN Jianghuai;CUI Junfeng;DUAN Beichen;CHEN Guoxin(Ningbo Institute of Material Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,China)

机构地区：[1]中国科学院宁波材料技术与工程研究所,宁波315201

出　　处：《理化检验（物理分册）》2024年第12期54-57,共4页Physical Testing and Chemical Analysis(Part A:Physical Testing)

基　　金：中国科学院仪器设备功能开发技术创新项目。

摘　　要：以Cr_(2)AlC涂层为例,详细介绍了一种基于微米柱的透射电镜试样制备方法。先利用高强度离子束将微米柱连同保护层下方区域四周的材料去除,形成长为10μm,深为6μm,厚为1μm的微米片,最后利用离子束将微米片减薄至透射电镜可观察的厚度。试样制备过程需在待减薄微米柱的两侧及顶端沉积保护层,以避免减薄过程中对微米柱产生加工损伤,从而获得高质量的透射电镜试样。Taking Cr_(2)AlC coating as an example,a preparation method of transmission electron microscope specimen based on micropillar was introduced in detail.First,the high-intensity ion beam was used to remove the material around the micropillars together with the area below the protective layer to form a micron sheet with a length of 10μm,a depth of 6μm,and a thickness of 1μm.Finally,the ion beam was used to thin the micron sheet to a thickness that could be observed by the transmission electron microscope.The sample preparation process needed to deposit a protective layer on both sides and the top of the micron column to be thinned to avoid processing damage to the micron column during the thinning process,thereby obtaining a high-quality transmission electron microscope sample.

关 键 词：聚焦离子束 微米柱压缩 透射电镜 减薄 试样制备 Cr_(2)AlC涂层 

分 类 号：TG115.211.2[金属学及工艺—物理冶金]