直流真空阴极弧管状内壁制备TiN涂层性能研究  

Micro-structure and properties of TiN film deposited on the barrel surface by DC cathodic vacuum arc technology

作　　者：吕玲 华程 梁鑫 廖广其 LU Ling;HUA Cheng;LIANG Xin;LIAO Guang-qi(Chengdu Aircraft Industrial(Group)Co.,Ltd.,Chengdu 610092)

机构地区：[1]成都飞机工业(集团)有限责任公司,成都610092

出　　处：《核聚变与等离子体物理》2024年第4期380-387,共8页Nuclear Fusion and Plasma Physics

摘　　要：采用直流真空阴极弧沉积技术在管状内壁上制备了TiN涂层。用光学显微镜、SEM(扫描电子显微镜)、台阶仪、X射线衍射能谱(XRD)、显微硬度计检测了涂层的结构和力学等相关特性。结果表明:管状内壁表面涂层厚度在2.7~3.0μm,厚度均匀性为94.7%;涂层表面粗糙,均存在着大量微米级的颗粒分布,表面粗糙度Ra较未处理的样品增幅约为0.2~0.3μm,涂层由立方相的TiN(111)、Ti N(102)、TiN(200)、TiN(220)、TiN(311)、TiN(222)组成。相同沉积温度条件下,氮气气压越高,涂层表面的颗粒度越细,表面显微硬度越高,TiN (111)的择优取向越明显;相同氮气气压下,沉积温度越高,涂层的表面显微硬度越高,TiN(111)的择优取向也越明显。TiN films were deposited on Cu plate and TC11 titanium alloy embedded in the barrel surface by DC cathodic vacuum arc technology.The structure and mechanical properties of TiN films were investigated by optical microscope,scanning electron microscopy(SEM),stylus profiler,X-ray diffraction(XRD)and micro-hardness tester.It was shown that all films are 2.7~3.0 micron thick.The film thickness uniformity is 94.7%.All films have coarse surface and large particles with magnitude of microns.The surface roughness Ra of all films increases by about 0.2~0.3 microns.Under the same deposition temperature,the particles on the film surface are refined with the nitrogen pressure.The films are composed of TiN with(111),(102),(200),(220),(311)and(222)planes.The microhardness of the film increases and the preferred orientation of TiN(111)is more distinct with the nitrogen pressure at the same deposition temperature.Moreover,the microhardness of the film increases and the preferred orientation of TiN(111)is more distinct with the deposition temperature at the same nitrogen pressure.

关 键 词：管状内壁 直流真空阴极弧 TIN涂层 显微硬度 择优取向 

分 类 号：TB43[一般工业技术]