高效除杂纯化器在氪氙产品中的应用  

Application of High Efficient Impurity Purifier in Krypton and Xenon Products

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作  者:李世君 郑梦杰 王建世 崔增涛 闫红伟 LI Shijun;ZHENG Mengjie;WANG Jianshi;CUI Zengtao;YAN Hongwei(Henan Xinlianxin Shenleng Energy Co.,Ltd.,Xinxiang 453700,China)

机构地区:[1]河南心连心深冷能源股份有限公司,河南新乡453700

出  处:《低温与特气》2024年第6期14-16,共3页Low Temperature and Specialty Gases

摘  要:高纯氪氙产品中的氟化物和轻组分是影响产品达到高纯度的主要杂质,同时也是制约氪氙精馏产量的因素。除杂纯化器利用稀有气体不易被吸附的有利条件,采用双重脱除,提升产品纯度的同时也提升了氪氙产品的产量。根据已投运一月的数据统计,5N氪气中CF4体积分数有效降低至<0.01×10^(-6),氙气中SF_(6)体积分数降低至<0.1×10^(-6);氪氙气日产量也提升了50%~70%。由于纯化器对于稀有气体和其它气体的选择性吸附,有效改善了氪氙产品质量的稳定性。Fluoride and light components in high purity krypton and xenon products are the main impurities which affect the high purity of products,and are also the factors which restrict the production of krypton and xenon distillation.The impurity purifier takes advantage of the fact that rare gases are not easily adsorbed,and adopts double removal to improve the purity of products and the output of krypton and xenon products.According to the data of one month operation,volume fraction of CF 4 in 5N krypton decreased to below 0.01×10^(-6)and volume fraction of SF_(6)in xenon decreased to below 0.1×10^(-6),and the daily output of krypton and xenon increased by 50%~70%.Conclusion:Because of the selective adsorption of rare gases and other gases by the purifier,the stability of krypton and xenon product quality is effectively improved.

关 键 词:纯化器   氟化物 

分 类 号:TQ117[化学工程—无机化工]

 

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