X射线超导转变边沿传感器超导薄膜研究  

The Research on the Superconducting Films for X-ray Superconducting Transition Edge Sensors

作　　者：贾娥 李万 胡家昊 白海军 陈建 徐骁龙 郭思明[3] 孙天宝[3] 赵晓波[3] 李劲劲[3] 王雪深[3] JIA E;LI Wan;HU Jiahao;BAI Haijun;CHEN Jian;XU Xiaolong;GUO Siming;SUN Tianbao;ZHAO Xiaobo;LI Jinjin;WANG Xueshen(College of Information Engineering,Shenyang University of Chemical Technology,Shenyang,Liaoning 110142,China;College of Physics,Sichuan University,Chengdu,Sichuan 610064,China;Center for Advanced Measurement Science,National Institute of Metrology,Beijing 100029,China)

机构地区：[1]沈阳化工大学信息工程学院,辽宁沈阳110142 [2]四川大学物理学院,四川成都610064 [3]中国计量科学研究院前沿计量科学中心,北京100029

出　　处：《计量学报》2025年第1期69-74,共6页Acta Metrologica Sinica

基　　金：国家重点研发计划(2022YFF0608303);国家自然科学基金(12303101);中国科学院重大科技基础设施开放共享课题(2023-SECUF-PT-000535);中国计量科学研究院基本业务费(AKYZZ2115)。

摘　　要：采用超高真空直流磁控溅射技术,分别制备了超导Mo薄膜和Mo/Au双层薄膜,研究了不同的溅射功率和溅射气压下薄膜的应力、粗糙度和超导转变温度的变化,实现了应力范围为-421~163 Mpa、粗糙度<1 nm、超导转变温度为1.06~1.10 K的Mo薄膜制备,并以此为基础制备了应力范围在-38 MPa至26 MPa之间,超导转变温度为80~350 mK的Mo/Au薄膜,为研制单能X射线超导转变边沿传感器(TES)提供了技术储备。Ultra-high vacuum DC magnetron sputtering technology was employed to fabricate both superconducting Mo films and Mo/Au bilayer films,The influence of varying sputtering powers and pressures on film stress,surface roughness,and superconducting transition temperature was investigated.The results for superconducting Mo films revealed a stress range from-421 MPa to 163 MPa,surface roughness below 1 nm,critical temperatures between 1.06 K and 1.10 K.For the Mo/Au films,the stress varied from-38 MPa to 26 MPa,with critical temperatures ranging from 80 mK to 350 mK.The developed Mo/Au bilayer film provides a technical reserve for the development of single-energy X-ray superconducting transition edge sensors(TES).

关 键 词：电学计量 超导转变边沿传感器 磁控溅射 超导薄膜 Mo/Au双层薄膜 单能X射线 

分 类 号：TB97[一般工业技术—计量学]