基于摩擦诱导选择性刻蚀的低反射率锗表面加工研究  

Research on Friction-induced Selective Etching for Low Reflectance Germanium Surface

作　　者：王义飞 何旺 陈婷婷 崔立聪 汪红波 余丙军[1] 钱林茂 WANG Yifei;HE Wang;CHEN Tingting;CUI Licong;WANG Hongbo;YU Bingjun;QIAN Linmao(School of Mechanical Engineering,Southwest Jiaotong University,Chengdu 610031;Smart City and Intelligent Transportation Institute,Southwest Jiaotong University,Chengdu 611756)

机构地区：[1]西南交通大学机械工程学院,成都610031 [2]西南交通大学智慧城市与交通学院,成都611756

出　　处：《机械工程学报》2024年第23期294-303,共10页Journal of Mechanical Engineering

基　　金：国家自然科学基金青年基金(52003037);四川省自然科学基金青年基金(2023NSFSC0977);西南交通大学新型交叉学科培育基金(2682022KJ017、2682023KJ022)资助项目。

摘　　要：具有特定表面结构的单晶锗在保持高红外折射率、低吸收、低色散、抗高温等传统优势的同时还具有反射率低的显著特点,这为高性能红外光学元器件制造、红外热辐射控制、光学涂层和减反技术的发展提供了理想的选择。湿法刻蚀在加工特定表面结构方面具有效率高、均匀性好等特点,在各向异性材料表面的纳米加工方面具有一定优势。然而,单晶锗表面的各向异性湿法刻蚀特征并不明显,使得其湿法刻蚀工艺进展缓慢,导致目前依然难以用湿法刻蚀的方法实现单晶锗微纳米结构的可控加工;同时,实现超低反射单晶锗表面的加工技术面临着易损伤、效率低、工艺复杂、成本高等技术挑战。为此,基于H_(2)O_(2)-NaOH刻蚀剂的摩擦诱导选择性刻蚀加工方法在单晶锗表面实现了可控的各向异性刻蚀,解决了传统湿法刻蚀加工技术难以在单晶锗表面直接加工纳米结构的瓶颈问题。最后,基于该方法加工出了多种单晶锗超构表面,并在800~1800 nm波段范围内实现了13%的超低反射率。这种独特的微纳米加工技术为低反射单晶锗超构表面的可控构筑提供了新的解决方案。The single-crystal germanium superstructure surface exhibits remarkable characteristics of low reflectance,while maintaining high infrared refractive index,low absorption,low dispersion,and high-temperature resistance,providing an ideal choice for the development of high-performance infrared optical devices,infrared thermal radiation control,optical coatings,and anti-reflection technologies.Wet selective etching exhibits characteristics such as high efficiency and good uniformity in fabricating specific surface structures,providing advantages in nanofabrication on the surface of various anisotropic materials.However,the anisotropic wet etching characteristics on the surface of single crystal germanium are not significant,which has resulted in slow progress in wet etching processes.Consequently,it is still challenging to achieve the controllable fabrication of nanostructures on single crystal germanium using wet etching methods.Additionally,the processing technology for achieving ultra-low reflectance surfaces on single crystal germanium faces technical challenges such as susceptibility to damage,low efficiency,complex processes,and high costs.To address this issue,a friction-induced selective etching method based on H_(2)O_(2)-NaOH etchants has achieved controllable anisotropic etching on the surface of single crystal germanium,overcoming the bottleneck issue of conventional wet etching techniques in direct fabrication of nanostructures on single crystal germanium surfaces.Finally,multiple single crystal germanium super structured surfaces were fabricated using this method,achieving an ultra-low reflectance of 13%within the wavelength range of 800-1800 nm.This unique nanofabrication technique provides a new solution for the controlled construction of low-reflectance single crystal germanium superstructures on surfaces.

关 键 词：单晶锗 超低反射率 超构表面 摩擦诱导选择性刻蚀 红外减反结构 

分 类 号：TH117[机械工程—机械设计及理论]