射频磁控溅射法制备MoS_(2)纳米薄膜的光学性能研究  

Study on the optical properties of MoS_(2)nanofilms prepared by RF magnetron sputtering

作　　者：樊志琴[1] 邢淑涵 李瑞[1] 张丽英 张俊峰 Fan Zhiqin;Xing Shuhan;Li Rui;Zhang Liying;Zhang Junfeng(College of Physics,Henan University of Technology,Zhengzhou 450001)

机构地区：[1]河南工业大学物理学院,郑州450001

出　　处：《化工新型材料》2025年第2期131-134,共4页New Chemical Materials

基　　金：2024年河南省研究生教育改革与质量提升工程项目(YJS2024ZX15);河南工业大学2023年度研究性教学课程项目(2023YJXJX-38);教育部高等学校物理学类专业教学指导委员会教改研究课题项目(JZW-23-GT-09)。

摘　　要：采用射频磁控溅射法在石英玻璃衬底表面沉积不同厚度的MoS_(2)纳米薄膜,利用扫描电镜(SEM)、X射线衍射(XRD)、紫外-可见光分光光谱(UV-Vis)和荧光光谱等手段对MoS_(2)薄膜结构及光谱性质进行表征。结果表明:溅射时间越长,MoS_(2)薄膜的结晶性越好。薄膜形成条状纳米结构相互交叠的表面形貌,样品表面形貌均匀致密。MoS_(2)纳米薄膜在可见光波段对短波长光源吸收较强,对长波长光源透射较强。随着溅射时间的增加,薄膜厚度增加,导致MoS_(2)纳米薄膜的吸收系数增加,透射率减小,光学带隙也逐渐减少。在MoS_(2)薄膜的发射谱中,位于675nm的A激子峰,对应的带隙为1.8eV。发射峰的强度随着MoS_(2)薄膜层数的增加而减小,发射峰的位置随着MoS_(2)薄膜层数的增加而蓝移。MoS_(2)nanofilms with different thicknesses were deposited on quartz glass substrates by radio-frequency(RF)magnetron sputtering method.The structure and optical properties of the MoS_(2)films were characterized using SEM,XRD,UV-Vis and fluorescence spectrometry.The results indicated that the longer the sputtering time,the better the crystallinity of the MoS_(2)films.The films formed a surface morphology with interlaced strip-like nanostructures,and the sample surface morphology was uniform and dense.The MoS_(2)nanofilms had strong absorption for short-wavelength light sources in the visible light band and strong transmission for long-wavelength light sources.With the increase of sputtering time,the thickness of the film increased,leading to the increase of absorption coefficient,the decrease of transmittance and the gradual decrease of optical bandgap of the MoS_(2)nanofilm.In the emission spectrum of the MoS_(2)films,the A exciton peak at 675nm corresponded to a bandgap of 1.8eV.The intensity of the emission peak decreased as the number of MoS_(2)film layers increased,and the position of the emission peak exhibited a blueshift as the number of layers of MoS_(2)film increased.

关 键 词：MoS_(2)薄膜 射频磁控溅射 光学性能 激子峰 

分 类 号：TQ136.12[化学工程—无机化工] TB383.2[一般工业技术—材料科学与工程]