离子束改善薄膜光学特性研究  

Improvements to Optical Properties of Thin Films Using Ion Beams

作　　者：任翼 周亚东 金尚忠 Ren Yi;Zhou Yadong;Jin Shangzhong(College of Optical and Electronic Technology,China Jiliang University,Hangzhou 310018,Zhejiang,China)

机构地区：[1]中国计量大学光学与电子科技学院,浙江杭州310018

出　　处：《激光与光电子学进展》2024年第21期417-423,共7页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(22204154)。

摘　　要：提出并设计一款具有双腔室结构的加热灯丝型辅助离子源,解决现有灯丝型离子源无法通入氧化性气体作为工作气体或灯丝工作时间较短的问题,使得该离子源可以用于氧化物薄膜的辅助制备,兼具活化源的部分功能。同时,设计相关的实验验证提出的辅助离子源的有效性。选取光通信领域常见的两种氧化物(Ta_(2)O_(5)和SiO_(2))薄膜作为沉积的膜层材料,改变离子源的电流、电压、偏压、工作气体流量等参数,并利用分光光度法测量所沉积的薄膜的透射率、折射率、吸收度,研究不同参数对薄膜的光学特性的影响。最终实验结果可以证明设计的灯丝型离子源的有效性,其可以提高沉积薄膜的质量。A novel auxiliary ion source with a dual-chamber structure featuring a heated filament was proposed and designed in this study.This innovation overcomes the limitations of current filament-based ion sources,which cannot accommodate oxidative gases as process gases or support extended filament operation time.The ion source presented herein is suitable for the assisted fabrication of oxide films and fulfills certain functions of an activator.To validate the efficacy of proposed ion source,a series of experiments were designed.Two common oxide films utilized in optoelectronics-tantalum pentoxide(Ta_(2)O_(5))and silicon dioxide(SiO_(2))were selected as the deposition materials.By systematically adjustmenting the parameters,including the ion source’s current,voltage,bias,and the flow rate of the working gas,as well as employing spectrophotometric techniques to quantify the optical characteristics such as the transmissivity,refractive index,and absorbance of deposited films,the effects of these parameters on the optical properties of the films were investigated.Experiment results conclusively affirm the effectiveness of the ion source design,where its ability to enhance the quality of the resultant films is demonstrated.

关 键 词：离子束辅助镀膜 离子源 结构设计 透射率 折射率 吸收度 

分 类 号：TN305.2[电子电信—物理电子学]