二维纳米栅格结构的聚焦离子束制备工艺  

Focused ion beam preparation process for two-dimensional nano grid structure

作　　者：周莹[1] 薛民杰[1] 郝玉红[1] 陈永康[1] Zhou Ying;Xue MinJie;Hao Yuhong;Chen Yongkang(Shanghai Institute of Measurement and Testing Technology)

机构地区：[1]上海市计量测试技术研究院

出　　处：《上海计量测试》2024年第6期15-18,共4页Shanghai Measurement and Testing

基　　金：上海市市场监督管理局科技计划项目(2022-20)。

摘　　要：采用聚焦离子束技术,制备了三个500 nm规格的二维纳米栅格结构样本。研究基底材料的再沉积、离子束在基底材料中的扩散、设备的机械误差等影响因素,优化了二维纳米栅格结构的聚焦离子束制备工艺。结果表明,三个二维纳米栅格结构x、y方向的实际尺寸与设计尺寸、三个样本之间对应的栅格周期尺寸具有高度的一致性,误差在±0.3%之内。该研究成果为纳米长度标准物质的研制、不同长度二维纳米栅格结构及其他复杂结构的FIB精密加工提供了重要的参考。Three two-dimensional nano grid structure samples with a specification of 500 nm are developed by FIB.By studying the factors such as the redeposition of substrate materials,diffusion of ion beam in substrate materials,and mechanical errors of equipment,the FIB preparation process of two-dimensional nano grid structures can be optimized.The results show that the actual dimensions of the three twodimensional nano grid structures in the x and y directions are highly consistent with the design dimensions,and the errors are within±0.3%,as well as the corresponding grid period dimensions between the three samples.The research results provide important reference for FIB precision processing of development of nanolength reference materials,two-dimensional nano grid structures of different lengths and other complex structures.

关 键 词：二维纳米栅格 聚焦离子束 纳米尺度 再沉积 离子束束流 

分 类 号：TB3[一般工业技术—材料科学与工程]