垂直腔面发射激光器专利技术布局和研究进展  

Patent Technology Layout and Research Advances in Vertical Cavity Surface Emitting Laser

作　　者：程灿 王治华[1] 孙曙旭[1] 吴博 Cheng Can;Wang Zhihua;Sun Shuxu;Wu Bo(Optics and Electronics Technology Invention Examination Department,Patent Office,China National Intellectual Property Administration,Beijing 100081,China)

机构地区：[1]国家知识产权局专利局光电技术发明审查部,北京100081

出　　处：《微纳电子技术》2025年第2期12-21,共10页Micronanoelectronic Technology

摘　　要：垂直腔面发射激光器(VCSEL)具有体积小、调制响应快、光束质量好、效率高、功耗低、易于集成为大面积阵列等诸多优点,广泛应用于光通信、光传感、激光显示、激光照明、激光雷达、消费电子如面部识别等领域,VCSEL技术成为一个备受关注的新兴技术。基于此,结合中国专利全文数据库(CNTXT)中2000—2022年间申请的涉及VCSEL技术的专利文献,分析了专利申请概况和主要申请人的专利申请布局策略。通过对该领域的专利技术分析,提出了目前VCSEL技术面临着不断提高光功率密度、改善光束质量、降低能耗和成本的挑战,介绍了目前VCSEL主要的技术发展,并对VCSEL未来的市场前景和技术发展方向进行展望,希望为我国VCSEL技术的产业发展和知识产权保护提供一些启示和参考。Vertical cavity surface emitting lasers(VCSELs)have the advantages of a small volume,fast modulation response,good beam quality,high efficiency,low power consumption,ease of integration into large area arrays,and so on.VCSELs are widely used in the fields of light communication,light sensing,laser display,laser illumination,laser radar,consumer electronics such as facial recognition,etc.VCSEL technology becomes an emerging technology of great interest.Based on this,the patent application outline and the patent application layout strategy of the main applicant were analyzed in combination with patent literature relating to VCSEL technology applied 2000—2022 in the Chinese patent full database(CNTXT).Through the patent technology analysis of the field,it is proposed herein that current VCSEL technology faces the challenges of increasing optical power density,improving beam quality and reducing energy consumption and cost,the main technological developments of current VCSELs are introduced,and the future market prospects and technological developments of VCSELs are expected,hoping to provide some motivations and references for technological development and intellectual property protection of VCSEL technology industry in China.

关 键 词：激光器 垂直腔面发射激光器(VCSEL) 高功率 光束质量 专利分析 

分 类 号：TN248.4[电子电信—物理电子学] G306[文化科学]