Observation and mechanism of non-uniform distribution of tin nuclei in preparing vapor diffusion coated Nb_(3)Sn thin film for SRF applications  

作　　者：Shuai Wu Yang Ye Zi-Qin Yang Yuan He Jian-Peng Li Guang-Ze Jiang Lu Li Shi-Chun Huang An-Dong Wu Hang-Xu Li Shao-Hua Lu Tao Liu Feng Qiu Cang-Long Wang Ji-Zheng Duan Teng Tan Zhi-Jun Wang Sheng-Hu Zhang Hong-Wei Zhao Wen-Long Zhan 

机构地区：[1]Institute of Modern Physics,Chinese Academy of Sciences,Lanzhou 730000,China [2]School of Nuclear Science and Technology,University of Chinese Academy of Sciences,Beijing 100049,China [3]Advanced Energy Science and Technology Guangdong Laboratory,Huizhou 516007,China [4]School of Microelectronics,Dalian University of Technology,Dalian 116000,China

出　　处：《Nuclear Science and Techniques》2025年第1期22-34,共13页核技术(英文)

基　　金：supported by the National Natural Science Foundation of China(No.12175283);Youth Innovation Promotion Association of Chinese Academy of Sciences(2020410);Advanced Energy Science and Technology Guangdong Laboratory(HND20TDSPCD,HND22PTDZD).

摘　　要：Growth of high-quality Nb_(3)Sn thin films for superconducting radiofrequency(SRF)applications using the vapor diffusion method requires a uniform distribution of tin nuclei on the niobium(Nb)surface.This study examines the mechanism underlying the observed non-uniform distribution of tin nuclei with tin chloride SnCl_(2).Electron backscatter diffraction(EBSD)analysis was used to examine the correlation between the nucleation behavior and orientation of niobium grains in the substrate.The findings of the density functional theory(DFT)simulation are in good agreement with the experimental results,showing that the non-uniform distribution of tin nuclei is the result of the adsorption energy of SnCl_(2)molecules by varied niobium grain orientations.Further analysis indicated that the surface roughness and grain size of niobium also played significant roles in the nucleation behavior.This study provides valuable insights into enhancing the surface pretreatment of niobium substrates during the growth of Nb_(3)Sn thin films using the vapor diffusion method.

关 键 词：NUCLEATION Tin chloride Non-uniform distribution Vapor diffusion Crystal orientation Adsorption energy 

分 类 号：TL50[核科学技术—核技术及应用]