检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:Yuan Ma Sen Wang Zhong-Shuai Wu
机构地区:[1]State Key Laboratory of Catalysis,Dalian Institute of Chemical Physics,Chinese Academy of Sciences,Dalian 116023,People’s Republic of China [2]School of Transportation Engineering,Dalian Jiaotong University,Dalian 116028,People’s Republic of China [3]University of Chinese Academy of Sciences,Beijing 100049,People’s Republic of China [4]Dalian National Laboratory for Clean Energy,Chinese Academy of Sciences,Dalian 116023,People’s Republic of China
出 处:《Nano-Micro Letters》2025年第5期117-144,共28页纳微快报(英文版)
基 金:supported by the National Natural Science Foundation of China(22125903,22439003,22209175);the National Key R&D Program of China(Grant 2022YFA1504100,2023YFB4005204);the Energy Revolution S&T Program of Yulin Innovation Institute of Clean Energy(Grant E412010508);the State Key Laboratory of Catalysis(No:2024SKL-A-001)。
摘 要:Microbatteries(MBs)are crucial to power miniaturized devices for the Internet of Things.In the evolutionary journey of MBs,fabrication technology emerges as the cornerstone,guiding the intricacies of their configuration designs,ensuring precision,and facilitating scalability for mass production.Photolithography stands out as an ideal technology,leveraging its unparalleled resolution,exceptional design flexibility,and entrenched position within the mature semiconductor industry.However,comprehensive reviews on its application in MB development remain scarce.This review aims to bridge that gap by thoroughly assessing the recent status and promising prospects of photolithographic microfabrication for MBs.Firstly,we delve into the fundamental principles and step-by-step procedures of photolithography,offering a nuanced understanding of its operational mechanisms and the criteria for photoresist selection.Subsequently,we highlighted the specific roles of photolithography in the fabrication of MBs,including its utilization as a template for creating miniaturized micropatterns,a protective layer during the etching process,a mold for soft lithography,a constituent of MB active component,and a sacrificial layer in the construction of micro-Swiss-roll structure.Finally,the review concludes with a summary of the key challenges and future perspectives of MBs fabricated by photolithography,providing comprehensive insights and sparking research inspiration in this field.
关 键 词:MICROBATTERIES PHOTOLITHOGRAPHY Internet of Things MICROPATTERNS On-chip energy storage
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:3.134.81.178