电子级四甲基硅烷的检测方法  

Detection Methods of Electronic Grade Tetramethylsilane

作　　者：谭小龙 李琴 万富强 侯建鑫 张刚 贺兆波 李少平 叶瑞 杜林 TAN Xiao-long;LI Qin;WAN Fu-qiang;HOU Jian-xin;ZHANG Gang;HE Zhao-bo;LI Shao-ping;YE Rui;DU Lin(Hubei Xingfu Electronic Material Co.,Ltd.)

机构地区：[1]湖北兴福电子材料股份有限公司

出　　处：《中国标准化》2024年第S1期219-225,共7页China Standardization

摘　　要：电子级四甲基硅烷(Tetramethylsilane,TMS)因其独特的化学性质,在半导体器件的化学气相沉积(CVD)等过程中发挥着关键作用。目前电子级四甲基硅烷在国际和国内都没有明确的标准可以参考。企业只能根据客户需求结合其他硅烷类产品的国标来制定质量标准。TMS不同生产阶段侧重的检测指标不同,半导体领域客户最关心的检测指标就是纯度和金属杂质。纯度通常采用气相色谱法,而金属杂质则通过ICP-OES和ICP-MS方法进行检测。外观采用目视法、水分采用卡尔费休库伦法、颗粒度采用激光粒度仪进行检测。Electronic-grade Tetramethylsilane(TMS)plays a critical role in processes such as Chemical Vapor Deposition(CVD)for semiconductor devices due to its unique chemical properties.Currently,there is no explicit standard for electronic-grade TMS available internationally or domestically.Enterprises can only develop quality standards based on customer requirements and in conjunction with national standards for other silane products.The focus of detection indicators varies at different production stages of TMS,with semiconductor field customers being most concerned about purity and metal impurities.Purity is typically measured by Gas Chromatography,while metal impurities are detected using Inductively Coupled Plasma Optical Emission Spectrometry(ICP-OES)and Inductively Coupled Plasma Mass Spectrometry(ICP-MS).Appearance is inspected by visual method,moisture content is determined by the Karl Fischer titration method,and particle size is measured using a laser particle size analyzer.

关 键 词：电子级四甲基硅烷 检测方法 纯度检测 气相色谱 金属杂质检测 ICP-OES ICP-MS 外观 水分 颗粒度 

分 类 号：O627.41[理学—有机化学]