A Computer Simulation Study on Deposition Patterns of Cyclic Diblock Copolymer Solution Nanodroplets:Influence of Polymer Length and Concentration  

作　　者：PEI Hanwen ZHANG Jun SUN Zhaoyan 

机构地区：[1]State Key Laboratory of Polymer Physics and Chemistry&Key Laboratory of Polymer Science and Technology,Changchun Institute of Applied Chemistry,Chinese Academy of Sciences,Changchun,130022,P.R.China [2]School of Applied Chemistry and Engineering,University of Science and Technology of China,Hefei,230026,P.R.China

出　　处：《Chemical Research in Chinese Universities》2025年第1期21-32,共12页高等学校化学研究(英文版)

基　　金：supported by the National Natural Science Foundation of China(Nos.52293471,22103081);the National Key R&D Program of China(No.2022YFB3707303).

摘　　要：Molecular dynamics simulations are conducted to investigate the deposition patterns of cyclic diblock copolymer solution nanodroplets on solid surfaces(walls).The primary focus is how initial polymer concentration,chain length,and solvent-wall interaction affect these patterns.Deposition patterns are categorized into phase diagrams,mainly composed of multihollow,coffee-ring,and multilayer structures.We also study the deposition of polymer blocks with different adsorption behavior by adjusting the interaction strength between the polymer block and the wall[ε_(A(B)W)],including weakly adsorbable(ε_(A(B)W)=0.6),moderately adsorbable(ε_(A(B)W)=1.0),and strongly adsorbable(εA(B)W=1.2)polymer blocks.This study identifies the key factors influencing the droplet’s deposition structure and elucidates the mechanisms behind pattern formation.The findings contribute to the design of deposition patterns for cyclic diblock copolymer solution nanodroplets,enhancing applications related to droplet evaporation.

关 键 词：Cyclic diblock copolymer NANODROPLET EVAPORATION Deposition pattern Chain length and concentration 

分 类 号：O63[理学—高分子化学]