半导体洁净室污染物扩散特性研究  

Research on behaviour of pollutant diffusion in semiconductor cleanroom

作　　者：梁天池 唐春丽 钱晓丽[2] 谭奔 黄颖恺 杨海军 王旭 LIANG Tianchi;TANG Chunli;QIAN Xiaoli;TAN Ben;HUANG Yingkai;YANG Haijun;WANG Xu(School of Energy and Power Engineering,Jiangsu University of Science and Technology,Zhenjiang 212100,China;Jiangsu Qi′an Construction Group Co.Ltd.,Nantong 226000,China)

机构地区：[1]江苏科技大学能源与动力学院,镇江212100 [2]江苏启安建设集团有限公司,南通226000

出　　处：《江苏科技大学学报(自然科学版)》2025年第1期31-37,共7页Journal of Jiangsu University of Science and Technology:Natural Science Edition

基　　金：江苏省研究生科研与实践创新计划项目(KYCX22_3741)。

摘　　要：随着集成电路集成度越来越高,对半导体洁净室洁净度的要求也逐渐变高,因此对洁净室内污染物浓度的控制显得尤为重要.文中针对某洁净室内不同位置设备的开启状态对污染物扩散的影响进行了数值模拟,比较了6种开启方案的速度场和浓度场.结果表明:活塞流能够有效控制污染物的扩散;处于活塞流区域的工作人员呼吸区的污染物浓度很小;中间设备产生的污染物会向两侧扩散,浓度场受两侧的风机过滤单元开启状态影响较大.研究结果为制定洁净室污染物控制策略提供理论依据.With the increase in the integration of integrated circuits,the requirements for cleanliness in semiconductor cleanrooms are also gradually increasing.Therefore,the control of the pollutant concentration is particularly important.The impact of the operating state of the equipment at different positions in a cleanroom on the pollutant diffusion is simulated in this paper.The velocity and concentration distribution are compared for six different cases.The results indicate that the diffusion of the pollutant can be effectively controlled by the piston flow.The pollutant concentration in the breath zone of the workers standing in the piston flow area is very small.The pollutant generated by the middle equipment diffuse from the center to the area of A and C.The concentration field is greatly affected by the fan filter units(FFU)opening status in Zone A and Zone C.The results provide a theoretical basis for the development of pollutant control methodology for cleanrooms.

关 键 词：洁净空调 气流组织 污染物扩散 

分 类 号：TU834.8[建筑科学—供热、供燃气、通风及空调工程] TB69[一般工业技术—制冷工程]