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作 者:李亮星[1] 王劲松 吴家航 程一 薛丽蓉 黄茜琳[1] LI Liangxing;WANG Jinsong;WU Jiahang;CHENG Yi;XUE Lirong;HUANG Xilin(School of Energy and Mechanical Engineering,Jiangxi University of Science and Technology,Nanchang 330013,China)
机构地区:[1]江西理工大学能源与机械工程学院,江西南昌330013
出 处:《电镀与涂饰》2025年第2期49-57,共9页Electroplating & Finishing
基 金:江西省自然科学基金(20192BAB206019)。
摘 要:[目的]高熵合金材料具有优异的力学性能和物理化学性能,近年来备受关注。[方法]采用脉冲电沉积技术在钛基体上制备WNiCoCuMo高熵合金薄膜。研究了温度、脉冲频率、占空比及峰值电流密度对合金薄膜形貌和元素组成的影响。通过电化学阻抗谱和塔菲尔曲线测试对比了不同峰值电流密度下所得高熵合金薄膜的耐腐蚀性能。[结果]电沉积WNiCoCuMo高熵合金薄膜的较优工艺条件为:温度30℃,峰值电流密度40 mA/cm^(2),脉冲频率2000 Hz,占空比0.7。在该条件下所得WNiCoCuMo高熵合金薄膜为微晶结构,呈“菜花状”形貌,元素成分均匀,耐腐蚀性能较优。[结论]采用脉冲电沉积法可获得耐腐蚀性能良好的WNiCoCuMo高熵合金薄膜。[Objective]High-entropy alloy materials have garnered significant attention in recent years due to their excellent mechanical,physical,and chemical properties.[Method]WNiCoCuMo high entropy alloy thin films were successfully prepared on titanium substrates using pulse electrodeposition technology.The effects of temperature,pulse frequency,duty cycle,and peak current density on the morphology and elemental composition of alloy thin films were studied.The corrosion resistance of high-entropy alloy films obtained at different peak current densities were compared through electrochemical impedance spectroscopy and Tafel curve measurement.[Result]The process conditions for electrodepositing WNiCoCuMo high-entropy alloy thin films were optimized as follows:temperature 30℃,peak current density 40 mA/cm^(2),pulse frequency 2000 Hz,and duty cycle 0.7.The WNiCoCuMo high-entropy alloy film obtained under the optimized conditions had a microcrystalline structure with a“cauliflower like”morphology,uniform element composition,and excellent corrosion resistance.[Conclusion]WNiCoCuMo high-entropy alloy thin films with good corrosion resistance can be prepared by pulsed electrodeposition.
分 类 号:TF841.1[冶金工程—有色金属冶金]
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