用于超分辨成像的低波前畸变二向色镜的研制  

Development of Low Wavefront Distortion Dichroic Mirror for Super-resolution Imaging

作　　者：黄宏宇 王瑞生[1] 林晓敏 梁显鹏 董明 袁泉 HUANG Hongyu;WANG Ruisheng;LIN Xiaomin;LIANG Xianpeng;DONG Ming;YUAN Quan(Shenyang Instrument Science Research Institute Co.,Ltd.,Shenyang 110043,China)

机构地区：[1]沈阳仪表科学研究院有限公司,沈阳110043

出　　处：《光子学报》2025年第1期136-143,共8页Acta Photonica Sinica

摘　　要：为满足超分辨荧光检测系统中高精度成像及快速检测的需求,研制了双波段低波前畸变二向色镜。通过研究退火温度对Ta_(2)O_(5)与SiO_(2)材料膜层应力的影响规律,反演拟合出两种材料膜层应力抵消时的膜层厚度比与退火温度关系式;基于拟合结果设计了一种双波段低波前畸变的膜系结构,通过退火法实现双波段低波前畸变二向色镜的制备。经测试,采用2 mm厚度的石英基底,光谱测试结果为T_(avg)>97%@504~544 nm、T_(avg)>97%@588~800 nm,T_(abs)<2%@450~491 nm、T_(abs)<2%@556~566 nm,波前畸变(反射PV值)测试结果为0.087λ。In recent years,with the rapid development of fluorescence imaging technology,there has been an increasing demand for detection.Super resolution fluorescence microscopy,by repeatedly activating and quenching fluorescent molecules to break through diffraction limits,combined with fluorescent labeling,can achieve nanoscale imaging and quickly and accurately detect human diseased cells.Therefore,it is widely used in the field of medical detection.Traditional dichroic mirrors mainly play a role in separating spectra in optical systems,while in fluorescence imaging optical systems,the performance of dichroic mirrors not only needs to consider spectral performance,but also the reflection wavefront distortion(also known as surface flatness PV)of the device.When the surface flatness of the device is poor,that is,when the PV value of the reflected wavefront distortion test result is large,phenomena such as“defocusing”,“astigmatism”,focal plane separation,and blurred spot size can occur after passing through the dichroic mirror.This problem causes the optical system to be unable to accurately distinguish cell structures at the nanoscale,thereby limiting the imaging results of the detection system.The reason for the poor surface flatness of the device is that during the deposition of multi-layer optical films,the surface flatness of the optical device can change under the action of film layer stress,resulting in changes in the surface shape of the coated product.Therefore,there is an urgent need to develop low wavefront dichroic filter devices.This article studies the effect of substrate resistance to thin film stress and finds that the stress change of thin films deposited on JGS1 is smaller than that on K9.Therefore,JGS1 is selected as the experimental substrate;by studying the effect of annealing temperature on the stress of Ta_(2)O_(5),Nb_(2)O_(5),and SiO_(2)material film layers,it is found that as the annealing temperature increases,the stress of Ta_(2)O_(5)material film reverses from compressive stress to tens

关 键 词：光学薄膜 二向色镜 波前畸变 退火 超分辨成像 

分 类 号：O484[理学—固体物理]