氧等离子体处理对HiPIMS制备Cr涂层耐蚀性能的影响  

Effect of Oxygen-plasma Treatment on Corrosion Resistance of Cr Coatings Deposited via HiPIMS

作　　者：张美琪 董宇峰 程勇 谭诗瑶 王丽 王应泉 柯培玲 王振玉 汪爱英[2] ZHANG Meiqi;DONG Yufeng;CHENG Yong;TAN Shiyao;WANG Li;WANG Yingquan;KE Peiling;WANG Zhenyu;WANG Aiying(School of Materials Science and Chemical Engineering,Ningbo University,Ningbo 315211,China;Key Laboratory of Advanced Marine Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences,Ningbo 315201,China;Ningbo Runner Co.,Ltd.,Ningbo 315000,China)

机构地区：[1]宁波大学材料科学与化学工程学院,宁波315211 [2]中国科学院宁波材料技术与工程研究所海洋关键材料重点实验室,宁波315201 [3]宁波威霖住宅设施有限公司,宁波315000

出　　处：《中国表面工程》2024年第6期236-246,共11页China Surface Engineering

基　　金：宁波市科技计划项目(2023QL049,2023Z110);中国科学院青年创新促进会会员(2023312)。

摘　　要：金属Cr涂层因抗氧化、耐腐蚀、抗磨损、色泽明亮等,在严苛环境防护和功能装饰领域应用广泛。但物理气相沉积(PVD)技术沉积的Cr涂层多以贯穿性柱状晶生长,耐腐蚀性能差,是科学界与产业界共同关注的难点挑战。与现有异质多层结构优化不同,采用高离化高功率脉冲磁控溅射(Hi PIMS)同步脉冲偏压技术,在316不锈钢基体表面沉积Cr涂层,通过不同周期氧等离子体处理改性,于涂层内形成Cr/Cr(O)多层结构,并进行研究。利用扫描电子显微镜(SEM)、扫描探针显微镜(SPM)、X射线衍射(XRD)、能谱仪(EDS)、X射线光电子能谱仪(XPS)等方法,表征涂层的相结构、表面粗糙度、表面/截面形貌、元素分布及化学键。利用Gamry电化学工作站和恒温盐雾腐蚀测试,研究涂层耐蚀性能。结果表明,氧等离子体处理不改变Cr涂层的体心立方结构,但能够打断涂层柱状晶贯穿生长,使涂层表面更加光滑;经过两次等离子体处理的Cr涂层表面粗糙度约为未处理涂层的1/4,腐蚀电流密度较未处理涂层降低了一个数量级,72 h盐雾腐蚀后未探测到基体腐蚀粒子。该方法为解决PVD技术制备高性能耐腐蚀Cr涂层提供了新思路。Metallic chromium(Cr) coatings have garnered significant attention in demanding nuclear energy applications for safeguarding the surface of zirconium alloy fuel claddings as well as for functional modifications and embellishments on metals,polymers used in automobiles, sanitary hardware, and 3C(China compulsory certification) products. In contrast to the rigid limitations of the electroplating technique, Cr coatings can be easily deposited via various physical vapor deposition(PVD)technologies, thus rendering them increasingly important as a protective option. However, the main bottleneck of Cr coatings is their inevitable columnar structures with coarse morphology during PVD deposition, which facilitates the easy penetration of chloride solutions into the substrate and visually obscures the gloss under exposure to humid conditions. Consequently, PVD-Cr coatings exhibit degraded protective performance and undesired failures. In this study, high-power pulsed magnetron sputtering(HiPIMS) is employed to deposit Cr coatings on 316 stainless steel and YG8 substrates. Synchronized pulsed biasing is performed during coating deposition. A crucial aspect of this method is the introduction of oxygen-plasma treatment within the Cr coating to form a composite Cr(O) layer to enhance the adhesion strength and corrosion resistance of the subsequent Cr coatings. Oxygen-plasma treatment is performed using a linear anode-layer ion source following the periodic manipulation of the Cr layer via Hi PIMS. The results show that the addition of oxygen plasma significantly suppresses the growth of columnar crystals within the monolayer of the Cr coating deposited via Hi PIMS. This observation is evidenced by the distinct inhibition of galvanic coupling corrosion in the heterogeneous multilayered coatings. In addition to modifying the microstructures, the O plasma does not compromise the outstanding decorative properties of the Cr coatings. For clarity, the surface morphology, crystalline structure, and chemical composition of the coating

关 键 词：Cr涂层 高功率脉冲磁控溅射(HiPIMS) 盐雾腐蚀 电化学腐蚀 

分 类 号：TG178[金属学及工艺—金属表面处理]