基于Ansys CFX的激光剥膜设备工艺腔室进气优化仿真分析  

Simulation Analysis of Process Chamber Inlet Optimization for Laser Film Stripping Equipment Based on Ansys CFX

作　　者：曹国斌 王贵森 CAO Guobin;WANG Guisen(The 2^(nd)Research Institute of CETC,Taiyuan 030024,China)

机构地区：[1]中国电子科技集团公司第二研究所,山西太原030024

出　　处：《电子工业专用设备》2025年第1期50-54,共5页Equipment for Electronic Products Manufacturing

摘　　要：基于Ansys CFX模拟激光剥膜设备工艺腔室内气体分布和稳定后腔室内氮气浓度的情况,经过CFX仿真分析得出:在前上方2个进口、后侧方2个出口固定情况下,对比分析增设匀流板前后流体分布,仿真明确在入口附近增设匀流板效果较好,改进后腔体内气体流动区域较大,且稳定后腔体内氮气浓度更高,最高点氮气浓度是未改善前设计浓度的2.39倍。Based on the simulation of gas distribution in the process chamber of the laser ablation equipment using Ansys CFX and the nitrogen concentration in the chamber after stabilization,the CFX simulation analysis reveals that,under the fixed conditions of two inlets at the front and top and two outlets at the rear,a comparative analysis of fluid distribution before and after the addition of a uniform flow plate indicates that adding a uniform flow plate near the inlets yields better results.After the improvement,the gas flow area within the chamber is larger,and the nitrogen concentration in the chamber after stabilization is higher.The highest point nitrogen concentration is 2.39 times the design concentration before improvement.

关 键 词：激光剥膜设备 流动仿真 氧气浓度 匀流板 

分 类 号：TN605[电子电信—电路与系统]