退火处理对 MgAl_(2)O_(4)光学性能及残余应力影响研究  

Effect of annealing treatment on the optical properties and residual stress of MgAl_(2)O_(4)

作　　者：张亚倩 姜玉刚[1] 荣景颂 张荣实 张彤 杨勇[1] ZHANG Yaqian;JIANG Yugang;RONG Jingsong;ZHANG Rongshi;ZHANG Tong(Tianjin Key Laboratory of Optical Thin Film,Tianjin Jinhang Institute of Technical Physics,Tianjin 300308,China)

机构地区：[1]天津津航技术物理研究所天津市薄膜光学重点实验室,天津300308

出　　处：《红外与激光工程》2025年第2期149-156,共8页Infrared and Laser Engineering

基　　金：天津市自然科学基金项目(22JCYBJC00520,22JCZDJC00080)。

摘　　要：通过无压烧结结合热等静压处理制备了 MgAl_(2)O_(4)透明陶瓷,同时采用应力双折射光程差和微区拉曼光谱特征峰频移两种方法表征材料的残余应力,重点研究了退火温度对于 MgAl_(2)O_(4)透明陶瓷全波段光学透过率、残余应力的影响,并通过基于Mie散射理论的离散偶极子计算、微观形貌表征以及晶格常数计算等方法对其影响机理进行分析和阐释。结果表明,当退火温度低于1 300℃时,透过率降低主要出现在450 nm以下,当退火温度高于1 300℃时,全波段透过率开始迅速下降,且短波波段透过率下降幅度明显高于红外波段。这主要是由于随着退火温度的升高,气孔发生膨胀、分裂增多后对不同波段电磁波散射所致。 MgAl_(2)O_(4)透明陶瓷内残余应力为压应力,且呈现出不均匀分布的特点,残余应力随退火温度的升高而逐渐降低,至最低点后继续升高退火温度,残余应力反而增加。晶格畸变是 MgAl_(2)O_(4)透明陶瓷产生残余应力的主要原因之一,当退火温度过高时,伴随着气孔膨胀和二次结晶,此时晶粒与晶粒,晶粒与气孔等界面的相互刚性挤压作用占主导。综合来看,当退火温度为1 200~1 250℃时,残余应力消除效果最好。Objective After undergoing processes such as molding,sintering,and hot isostatic pressing,MgAl_(2)O_(4) transparent ceramics accumulate significant residual stresses inside,directly affecting the optical uniformity of the material,and even causing deformation and cracking during subsequent processing and application due to stress release.In addition,due to the fact that the hot isostatic pressing heating components are made of carbon fiber material,they can cause a certain degree of carbon pollution to the pre-fired parts under high temperature and high-pressure conditions.They are issues that must be addressed and solved in engineering applications.The annealing process has always been used in the field of metal and glass heat treatment,while the application in the field of transparent ceramics focuses more on the influence of annealing process on the optical properties.However,there is a lack of in-depth research on its influence mechanism.At the same time,removing residual stress is one of the main purposes of annealing treatment for transparent ceramic materials,and its evolution process analysis is rarely reported.Therefore,it is very necessary to conduct research on the effect and mechanisms of annealing treatment on the optical properties and residual stress.In addition,the temperature range for rapid growth of MgAl_(2)O_(4) transparent ceramics grains can be determined,providing a reliable reference for the practical application of the material.Methods In this paper,MgAl_(2)O_(4) transparent ceramics were prepared by pressureless sintering combined with hot isostatic pressing treatment.The residual stress of the material was characterized by two methods:stress birefringence optical path difference and micro-Raman spectroscopy characteristic peak frequency shift.The influence of annealing temperature on the full wavelength optical transmittance and residual stress of MgAl_(2)O_(4) transparent ceramics was mainly studied.The influence mechanism was analyzed and explained by discrete dipole calculation based

关 键 词：MgAl_(2)O_(4)透明陶瓷 退火处理 光学性能 残余应力 

分 类 号：TQ174[化学工程—陶瓷工业]