超纯氦中痕量氖测定方法研究  

Study on Determination of Trace Neon in Ultra-pure Helium

作　　者：王莎 杨惠钧 熊德权 陈琳 张瑞春 WANG Sha;YANG Huijun;XIONG Dequan;CHEN Lin;ZHANG Ruichun(Chengdu Natural Gas Chemical General Plant,PetroChina Southwest Oil&Gas Field Company,Chengdu 610072,China)

机构地区：[1]中石油西南油气田成都天然气化工总厂,四川成都610072

出　　处：《低温与特气》2025年第1期41-45,共5页Low Temperature and Specialty Gases

摘　　要：结合浓缩富集和等离子检测技术,建立超纯氦中痕量氖预浓缩等离子发射气相色谱分析方法,将超纯氦中痕量氖检出下限降至0.001×10^(-6),确定了该方法的操作条件,考查了方法性能,证明该方法准确可行。Combined with concentration and plasma detection technology,establish an analytical method for the determination of trace neon in ultra-pure helium by plasma emission gas chromatography,reduced the lower detection limit to 0.001×10^(-6).This article confirmed the operating conditions of the method,examined the performance of the method,proved to be accurate and feasible.

关 键 词：超纯氦 痕量氖 分析方法 等离子 

分 类 号：TB21[一般工业技术—工程设计测绘]