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作 者:李兆良 朱坪 张栋俊 康俊[2] 谢兴龙[2] 李建郎 刘德安[2] 朱健强[2] 张大伟[1] Li Zhaoliang;Zhu Ping;Zhang Dongjun;Kang Jun;Xie Xinglong;Li Jianlang;Liu Dean;Zhu Jianqiang;Zhang Dawei(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China;Joint Laboratory of High Power Laser Physics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China)
机构地区:[1]上海理工大学光电信息与计算机工程学院,上海200093 [2]中国科学院上海光学精密机械研究所高功率激光物理联合实验室,上海201800
出 处:《激光与光电子学进展》2024年第23期214-221,共8页Laser & Optoelectronics Progress
基 金:国家自然科学基金(12004403,12074399,12204500);中国科学院战略性先导科技专项(A类)(XDA25020105);中国科学院国际大科学计划培育专项(181231KYSB20170022);中国科学院重点实验室基金(CXJJ-23S015);上海市扬帆计划(22YF1455300);上海市科委地方高校能力建设项目(22010503200)。
摘 要:针对高功率激光系统色差的测量,提出一种基于波长扫描全息干涉的超短脉冲激光系统色差测量技术,获得不同波长超短脉冲的波前信息,并通过泽尼克多项式拟合得到不同波长的离焦色散信息。在实验中准确测量色差补偿单元引入的色差,测量得到的离焦色散系数和理论模拟的结果具有较好的一致性,长波长的离焦色差为负值,短波长的离焦色差为正值。进一步对比不同波长的聚焦焦点位置,验证了所提色差测量方法的准确性。所提方法能够有效测量超短脉冲激光系统的色差信息,并对色差补偿的精密调控提供准确的数据支持。For the measurement of chromatic aberration in high power laser systems,this article proposed a chromatic aberration measurement technology for ultrashort pulse laser system based on wavelength scanning holographic interferometry to obtain wavefront and defocus dispersion information at different wavelengths.Chromatic dispersion information of different wavelengths were obtained using a Zernike polynomial fitting.Chromatic aberration introduced by the chromatic aberration compensation unit was accurately measured.Results were in good agreement with the theoretical simulation results,defocus chromatic aberrations at longer and shorter wavelengths were negative and positive,respectively.The precision of proposed method was validated by comparing focal points at different wavelengths.Proposed method could effectively measure chromatic aberration in ultrashort pulse laser systems,and provide accurate data support for the precise control of chromatic aberration compensation.
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