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作 者:绪方洁 铃木泰雄 毕婷婷 OGATA Kiyoshi;SUZUKI Yasuo;BI Tingting(Plasma Ion Assist Co.,Ltd.,Kyoto 612-8373,Japan;Dalian Jintai Xieli Technology Co.,Ltd.,Dalian 116100,China)
机构地区:[1]Plasma Ion Assist Co.,Ltd.,日本京都612-8373 [2]大连金泰协力科技有限公司,辽宁大连116100
出 处:《真空》2025年第2期68-76,共9页Vacuum
摘 要:介绍了等离子注入成膜(PIAD)方式的原理和特征,即通过高频放电使原料气体离化而生成离子,然后将其注入到施有高压脉冲电压的基材中。描述了用PIAD方式成膜的类金刚石(DLC)薄膜的特征和应用案例,结果表明PIAD方式可以通过脉冲电压和其他成膜参数控制DLC薄膜中sp2结构石墨层以及sp3结构金刚石层的生长,因此可以制备出具有耐腐蚀性和导电性功能的DLC薄膜。重点介绍了关于PIAD方式功能性DLC薄膜在燃料电池金属双极板表面处理上的应用研究成果。The principles and characteristics of the plasma ion assisted deposition(PIAD)method are described,in which ions generated by ionizing raw material gas by high-frequency discharge are implanted into a base material to which a high voltage pulse voltage is applied.The characteristics and application examples of the diamond-like carbon thin film(DLC thin film)formed by PIAD method are introduced.The PIAD method can control the growth of the sp2-structured graphite layer and the sp3-structured diamond layer in the DLC thin film by pulse voltage and other film-forming conditions,so the DLC thin film that exhibits corrosion resistance and conductivity can be formed.The results of the development of functional DLC thin film prepared by the PIAD method in surface treatment for the metal separator of the fuel cells are introduced emphatically.
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