Stabilization of the stainless‑steel interface using sequentially deposited Al_(2)O_(3)nano films using atomic layer deposition(ALD)technique  

作　　者：Abhishek Sharma Sudipa Manna Prem Kumar Mishra Surendra Singh Ashis Kumar Satpati 

机构地区：[1]Analytical Chemistry Division,Bhabha Atomic Research Centre,Trombay,Mumbai 400085,India [2]Homi Bhabha National Institute,Anushaktinagar,Mumbai 400094,India [3]Solid State Physics Division,Bhabha Atomic Research Centre,Trombay,Mumbai 400085,India

出　　处：《Surface Science and Technology》2024年第1期275-285,共11页表面科学技术(英文)

摘　　要：Atomic layer deposition(ALD)has been an important surface processing technique of materials of important applications.In the present investigation aluminum oxide thin films are generated using ALD technique(ALD-Al_(2)O_(3)).The ALD-Al_(2)O_(3)films are formed over SS304 substrates with thicknesses of 20,75 and 100 nm and the corrosion investigations are carried out using polarization and impedance measurements.The neutron reflectivity measurements are carried out to measure the thickness and surface roughness of the film.The corrosion property of SS304 observed to be reduced on ALD deposition which has been evident from the polarization measurements and supported by the electrochemical impedance measurements.The ennoblement in the corrosion potential has been observed due to the ALD-Al_(2)O_(3)film formation over the SS304 surface.The polarization resistance remained high even at high applied anodic potential of 0.7 V,the protection remained stable even at an elevated temperature of 60οC.The investigation supports the primary objective of the important role of the protection of material through thin ALD-Al_(2)O_(3)protective films.

关 键 词：Atomic layer deposition(ALD) Al_(2)O_(3) Tafel plot Neutron reflectivity Corrosion 

分 类 号：TG1[金属学及工艺—金属学]