Impurity sputtering model for ICRF edge plasma-surface interactions  

作　　者：Quan-Zhi Zhang Ze-Xuan Liu Fang-Fang Ma Lei-Yu Zhang Nosir Matyakubov 张权治;刘泽璇;马方方;张雷宇;Nosir Matyakubov

机构地区：[1]School of Physics,Dalian University of Technology,Dalian 116024,China [2]Department of Physics,Urgench State University,Urgench 220100,Uzbekistan [3]School of Engineering,New Uzbekistan University,Tashkent 100007,Uzbekistan

出　　处：《Chinese Physics B》2025年第3期168-175,共8页中国物理B(英文版)

基　　金：financially supported by the National MCF Energy R&D Program(Grant No.2022YFE03190100);the National Natural Science Foundation of China(Grant Nos.12422513,12105035,U21A20438);the Xiaomi Young Talents Program。

摘　　要：One of the primary concerns associated with ion cyclotron resonance heating(ICRH)is the enhanced impurity sputtering resulting from radio frequency(RF)sheath formation near plasma-facing components(PFCs),such as limiters.Developing a sputtering model integrated with RF sheath simulations allows for a more comprehensive understanding of the kinetic behavior of incident ions and their interactions with the limiter surface.We accordingly develop an impurity sputtering model“PMSAD”,which computes the sputtering yield(amount of impurity)on the limiter surface based on incident ion characteristics and predicts the spatial distribution of impurities.The model provides a robust method for understanding and analyzing the impurity sputtering process from limiter surfaces,which is crucial for preventing ICRH surface erosion and reducing edge and core plasma contamination.

关 键 词：ion cyclotron resonance heating(ICRH) radio frequency(RF)sheath physical sputtering 

分 类 号：TL6[核科学技术—核技术及应用]