致密/疏松/致密叠层氧化钨电致变色薄膜设计与制备  

Design and Preparation of Compact/Loose/Compact Laminated WO_(x)Electrochromic Films

作　　者：张炯 李睿聪 蔡晓佳 孙丹丹 唐秀凤 ZHANG Jiong;LI Rui-cong;CAI Xiao-jia;SUN Dan-dan;TANG Xiu-feng(School of Civil Engineering and Architecture,Wuyi University,Jiangmen 529020;School of Applied Physics and Materials,Wuyi UniversityJiangmen 529020,China;School of Chemical Engineering and Energy Technology,Dongguan University of Technology,Dongguan 523808,China)

机构地区：[1]五邑大学土木建筑学院,江门529020 [2]五邑大学应用物理与材料学院,江门529020 [3]东莞理工学院化学工程与能源技术学院,东莞523808

出　　处：《武汉理工大学学报》2024年第12期16-23,共8页Journal of Wuhan University of Technology

基　　金：国家自然科学基金(12004285);五邑大学创新创业基金(2022CX47)。

摘　　要：氧化钨薄膜因调制范围高、可逆性和循环稳定性好等优点被广泛应用于电致变色领域。但是,单一形貌的氧化钨薄膜难以满足使用要求。因此,以直流反应磁控溅射方法,通过调控沉积气压和功率制备叠层氧化钨薄膜(致密/疏松/致密),其中上致密层作为记忆效应功能层、中间疏松层作为电致变色功能层、下致密层作为附着力功能层。通过与单一形貌薄膜相比,叠层氧化钨薄膜在波长550 nm处达到最高调制率(75%),且记忆效应与单一致密薄膜相似,响应时间与单一疏松薄膜相近。该研究将创新变色功能层设计思路。WO_(x) films are widely used in the field of electrochromic due to their high modulation range,good reversibility,and cycling stability.However,WO_(x) films with a single morphology are difficult to meet the requirements for use.Therefore,this article uses the direct current reactive magnetron sputtering method to prepare stacked WO_(x) films(dense/loose/dense)by adjusting the deposition pressure and power.The upper dense layer serves as the memory effect functional layer,the middle loose layer serves as the electrochromic functional layer,and the lower dense layer serves as the adhesion functional layer.Compared with a single morphology film,the stacked WO_(x) film achieves the highest modulation rate(75%)at a wavelength of 550 nm,and the memory effect is similar to that of a single dense film,with a response time similar to that of a single porous film.This study will innovate the design concept of the color changing functional layer.

关 键 词：WOx薄膜 形貌设计 叠层设计 电致变色 

分 类 号：O484[理学—固体物理]