Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation  

在线阅读下载全文

作  者:Chao YE 叶超(School of Physics Science and Technology,Jiangsu Key Laboratory of Frontier Material Physics and Devices,Soochow University,Suzhou 215006,People’s Republic of China;Jiangsu Key Laboratory of Advanced Negative Carbon Technologies,Soochow University,Suzhou 215123,People’s Republic of China)

机构地区:[1]School of Physics Science and Technology,Jiangsu Key Laboratory of Frontier Material Physics and Devices,Soochow University,Suzhou 215006,People’s Republic of China [2]Jiangsu Key Laboratory of Advanced Negative Carbon Technologies,Soochow University,Suzhou 215123,People’s Republic of China

出  处:《Plasma Science and Technology》2025年第3期111-117,共7页等离子体科学和技术(英文版)

基  金:supported by National Natural Science Foundation of China (No.11275136)。

摘  要:The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering.

关 键 词:electron series resonance magnetron sputtering radio-frequency discharge 

分 类 号:O17[理学—数学]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象