熔盐电镀制备钍靶研究  

Study on Preparation of Thorium Target by Molten Salt Electroplating

作　　者：曹磊[1] 贾艳虹 贾先禄[1] 姚本林 安世忠[1] 李斌[1] 唐洪彬[1] Cao Lei;Jia Yanhong;Jia Xianlu;Yao Benlin;An Shizhong;Li Bin;Tang Hongbing(China Institute of Atomic Energy,Beijing 102413,China)

机构地区：[1]中国原子能科学研究院,北京102413

出　　处：《广东化工》2025年第4期19-21,18,共4页Guangdong Chemical Industry

摘　　要：当前国际上Ac-225生产研究主要集中在通过加速器产生的高能质子直接辐照钍靶(Th-232)方式上,工艺简单且经济的熔盐电镀法制备钍靶获得了广泛的研究。获得稳定可靠的电镀工艺将对锕的生产提供重要支持。本文研究了熔盐电镀钍靶,得到关键工艺参数:在低水氧的氩气手套箱中,采用ThCl_(4)-LiCl-KCl-LiF作为新型电解质体系,电解温度773 K,以石墨板作阳极,以铜板靶作为阴极,得到更加均匀钍电镀层。该方法将为制锕的钍靶的研制提供了新的技术。At present,the international research on the production of Ac-225 mainly focuses on the direct irradiation of thorium targets(Th-232)by high-energy protons generated by accelerators,and the preparation of thorium targets by molten salt electroplating,which is simple and economical,has been widely studied.Obtaining a stable and reliable plating process provides important support for actinium production.In this paper,the molten salt electroplating thorium target was studied,and the key process parameters were obtained:in the argon glove box with low water oxygen,ThCl_(4)-LiCl-KCl-LiF was used as a new electrolyte system,the electrolysis temperature was 773K,and the graphite plate was used as the anode and the copper plate target was used as the cathode to obtain a more uniform thorium plating layer.This method will provide a new technology for the development of thorium targets for actinium.

关 键 词：熔盐 电镀 钍靶 Ac-225制备 

分 类 号：TL211[核科学技术—核燃料循环与材料]